Ultracompact polarization converter with a dual subwavelength trench built in a silicon-on-insulator waveguide

The design and fabrication of an ultracompact silicon-on-insulator polarization converter is reported. The polarization conversion with an extinction ratio of 16 dB is achieved for a conversion length of only 10 μm. Polarization rotation is achieved by inducing a vertical asymmetry by forming in the...

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Veröffentlicht in:Optics letters 2012-02, Vol.37 (3), p.365-367
Hauptverfasser: Velasco, Aitor V, Calvo, María L, Cheben, Pavel, Ortega-Moñux, Alejandro, Schmid, Jens H, Ramos, Carlos Alonso, Fernandez, Iñigo Molina, Lapointe, Jean, Vachon, Martin, Janz, Siegfried, Xu, Dan-Xia
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Sprache:eng
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Zusammenfassung:The design and fabrication of an ultracompact silicon-on-insulator polarization converter is reported. The polarization conversion with an extinction ratio of 16 dB is achieved for a conversion length of only 10 μm. Polarization rotation is achieved by inducing a vertical asymmetry by forming in the waveguide core two subwavelength trenches of different depths. By taking advantage of the calibrated reactive ion etch lag, the two depths are implemented using a single mask and etching process. The measured converter loss is -0.7 dB and the 3 dB bandwidth is 26 nm.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.37.000365