Properties of indium tin oxide thin films prepared on the oxygen plasma-treated polycarbonate substrate

We prepared the indium tin oxide thin (ITO) film on the polymer substrate by using facing target sputtering method. To obtain a smooth surface of the ITO thin film for application of OLEDs, before deposition of the ITO thin film, the polymer substrate was given plasma surface treatment. The electric...

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Veröffentlicht in:Thin solid films 2011-08, Vol.519 (20), p.6844-6848
Hauptverfasser: Jung, Yu Sup, Kim, Woo-Jae, Choi, Hyung-Wook, Park, Yong-Seo, Kim, Kyung Hwan
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Sprache:eng
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Zusammenfassung:We prepared the indium tin oxide thin (ITO) film on the polymer substrate by using facing target sputtering method. To obtain a smooth surface of the ITO thin film for application of OLEDs, before deposition of the ITO thin film, the polymer substrate was given plasma surface treatment. The electrical and surface properties were measured by a Hall Effect measurement and a contact angle measurement. The structural and optical properties were evaluated by an X-ray diffractometer, an atomic force microscope and a UV/VIS spectrometer, respectively. All ITO thin films deposited on plasma-treated polymer substrate showed an average transmittance over 85% in visible range, and the lowest resistivity was 4.17 × 10 − 4 Ω cm.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.01.407