Investigation of Nitrogen HXR with Neon Admixture on the APF Plasma Focus

An investigation on the HXR emitted from APF plasma focus device operated with different volumetric ratios of nitrogen-neon (N 2 :Ne) admixture working gas at different voltage-pressure limits is presented. The optimum pressures obtained at the applied voltages of 12, and 13 kV were 3.5 torr for percentage of (50:50) of (N 2 :Ne) admixture and 3 torr for percentages of (75:25) and (90:10) in admixture and also for pure N 2 , while at the voltage of 11 kV, the optimum pressures were 3 torr for percentage of (50:50) and 2.5 torr for percentages of (75:25), (90:10), and pure N 2 . At each applied voltages of 11, 12, and 13 kV, with increasing percentage of N 2 in the (N 2 :Ne) admixture, the intensity of HXR was found to increase where the low intensity was for percentage of (50:50) of (N 2 :Ne) and the higher intensity was for pure N 2 . The results illustrate that the voltage and the composition of working gas are effective parameters in the HXR emission from a plasma focus device.