Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates

Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates

We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deute...

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Veröffentlicht in:ACS nano 2012-01, Vol.6 (1), p.979-985
Hauptverfasser: Cataldo, Stefano, Zhao, Jun, Neubrech, Frank, Frank, Bettina, Zhang, Chunjie, Braun, Paul V, Giessen, Harald
Format: Artikel
Sprache:eng
Schlagworte:
Absorption
Antennas
Biology
Colloids
Infrared
Infrared absorption
Infrared Rays
Infrared spectroscopy
Materials Testing
Metamaterials
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology
Optical properties
Particle Size
Photography - methods
Porosity
Refractometry
Surface Plasmon Resonance - methods
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Beschreibung
Zusammenfassung:We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn2047982