Deposition of LiNbO sub(3) thin films for selective etching

Deposition of LiNbO sub(3) thin films for selective etching

Ferroelectric lithium niobate (LiNbO sub(3)) thin films were epitaxially fabricated on sapphire (0001) and polycrystalline diamond substrates using pulsed laser deposition (PLD). Various deposition conditions are investigated to realize deposition of c-axis oriented LiNbO sub(3) thin film. The LiNbO...

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Veröffentlicht in:Journal of electroceramics 2006-12, Vol.17 (2-4), p.933-935
Hauptverfasser: Kim, Hyun-Jun, Kim, Dal-Young, Ha, Jong-Yoon, Kang, Chong-Yun, Sung, Man Young, Cho, Bong Hee, Yoon, Seok-Jin, Kim, Hyun-Jai
Format: Artikel
Sprache:eng
Schlagworte:
Ceramics
Deposition
Etching
Ferroelectric materials
Polycrystalline diamond
Pulsed laser deposition
Scanning electron microscopy
Thin films
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Zusammenfassung:Ferroelectric lithium niobate (LiNbO sub(3)) thin films were epitaxially fabricated on sapphire (0001) and polycrystalline diamond substrates using pulsed laser deposition (PLD). Various deposition conditions are investigated to realize deposition of c-axis oriented LiNbO sub(3) thin film. The LiNbO sub(3) thin films were chemically etched after electric poling, being investigated by scanning electron microscope (SEM).
ISSN:1385-3449
1573-8663
DOI:10.1007/s10832-006-0467-z