Anomalous radiation effects in fully depleted SOI MOSFETs fabricated on SIMOX

We investigate the proton tolerance of fully depleted silicon-on-insulator (SOI) MOSFETs with H-gate and regular-gate structural configurations. For the front-gate characteristics, the H-gate does not show the edge leakage observed in the regular-gate transistor. An anomalous kink in the back-gate l...

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Veröffentlicht in:IEEE transactions on nuclear science 2001-12, Vol.48 (6), p.2146-2151
Hauptverfasser: Ying Li, Guofu Niu, Cressler, J.D., Patel, J., Marshall, C.J., Marshall, P.W., Kim, H.S., Reed, R.A., Palmer, M.J.
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Sprache:eng
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Zusammenfassung:We investigate the proton tolerance of fully depleted silicon-on-insulator (SOI) MOSFETs with H-gate and regular-gate structural configurations. For the front-gate characteristics, the H-gate does not show the edge leakage observed in the regular-gate transistor. An anomalous kink in the back-gate linear I/sub D/-V/sub GS/ characteristics of the fully depleted SOI nFETs has been observed at high radiation doses. This kink is attributed to charged traps generated in the bandgap at the buried oxide/silicon film interface during irradiation. Extensive two-dimensional simulations with MEDICI were used to understand the physical origin of this kink. We also report unusual self-annealing effects in the devices when they are cooled to liquid nitrogen temperature.
ISSN:0018-9499
1558-1578
DOI:10.1109/23.983187