Electrocaloric effect of PMN-PT thin films near morphotropic phase boundary

The electrocaloric effect is calculated for PMN-PT relaxor ferroelectric thin film near morphotropic phase boundary composition. Thin film of thickness, ∼240 nm, has been deposited using pulsed laser deposition technique on a highly (111) oriented platinized silicon substrate at 700°C and at 100 mto...

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Veröffentlicht in:Bulletin of materials science 2009-06, Vol.32 (3), p.259-262
Hauptverfasser: Saranya, D., Chaudhuri, Ayan Roy, Parui, Jayanta, Krupanidhi, S. B.
Format: Artikel
Sprache:eng
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Zusammenfassung:The electrocaloric effect is calculated for PMN-PT relaxor ferroelectric thin film near morphotropic phase boundary composition. Thin film of thickness, ∼240 nm, has been deposited using pulsed laser deposition technique on a highly (111) oriented platinized silicon substrate at 700°C and at 100 mtorr oxygen partial pressure. Prior to the deposition of PMN-PT, a template layer of LSCO of thickness, ∼60 nm, is deposited on the platinized silicon substrate to hinder the pyrochlore phase formation. The temperature dependent P-E loops were measured at 200 Hz triangular wave operating at the virtual ground mode. Maximum reversible adiabatic temperature change, Δ T = 31 K, was calculated at 140°C for an external applied voltage of 18 V.
ISSN:0250-4707
0973-7669
DOI:10.1007/s12034-009-0039-3