Technology development of high-quality n-type multicrystalline silicon for next-generation ultra-thin crystalline silicon solar cells

This paper, under the NEDO project, aims at technology development of high-quality, n-type multicrystalline Si wafers. The targets of the technology development are to realize a high minority-carrier lifetime of 1 ms and to apply for a commercial solidification furnace. In particular, real-time obse...

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Veröffentlicht in:Solar energy materials and solar cells 2009-06, Vol.93 (6), p.1139-1142
Hauptverfasser: Dhamrin, M., Saitoh, T., Kamisako, K., Yamada, K., Araki, N., Yamaga, I., Sugimoto, H., Tajima, M.
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Sprache:eng
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Zusammenfassung:This paper, under the NEDO project, aims at technology development of high-quality, n-type multicrystalline Si wafers. The targets of the technology development are to realize a high minority-carrier lifetime of 1 ms and to apply for a commercial solidification furnace. In particular, real-time observation of the unidirectional solidification process, the effect of quartz crucible quality on the ingots, the quality improvement of n-type Si wafers and evolution to a commercial furnace will be described.
ISSN:0927-0248
1879-3398
DOI:10.1016/j.solmat.2009.02.011