SEM analysis of enamel surface treated by Er:YAG laser: Influence of irradiation distance
Background: Depending on the distance of laser tip to dental surface a specific morphological pattern should be expected. However, there have been limited reports that correlate the Er:YAG irradiation distance with dental morphology. Purpose: To assess the influence of Er:YAG laser irradiation dista...
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Veröffentlicht in: | Microscopy research and technique 2008-07, Vol.71 (7), p.536-541 |
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Sprache: | eng |
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Zusammenfassung: | Background:
Depending on the distance of laser tip to dental surface a specific morphological pattern should be expected. However, there have been limited reports that correlate the Er:YAG irradiation distance with dental morphology.
Purpose:
To assess the influence of Er:YAG laser irradiation distance on enamel morphology, by means of scanning electron microscopy (SEM).
Methods:
Sixty human third molars were employed to obtain discs (≅1 mm thick) that were randomly assigned to six groups (n = 10). Five groups received Er:YAG laser irradiation (80 mJ/2 Hz) for 20 s, according to the irradiation distance: 11, 12, 14, 16, or 17 mm and the control group was treated with 37% phosphoric acid for 15 s. The laser‐irradiated discs were bisected. One hemi‐disc was separated for superficial analysis without subsequent acid etching, and the other one, received the phosphoric acid for 15 s. Samples were prepared for SEM.
Results:
Laser irradiation at 11 and 12 mm provided an evident ablation of enamel, with evident fissures and some fused areas. At 14, 16 and 17 mm the superficial topography was flatter than in the other distances. The subsequent acid etching on the lased‐surface partially removed the disorganized tissue.
Conclusions:
Er:YAG laser in defocused mode promoted slight morphological alterations and seems more suitable for enamel conditioning than focused irradiation. The application of phosphoric acid on lased‐enamel surface, regardless of the irradiation distance, decreased the superficial irregularities. Microsc. Res. Tech., 2008. © 2008 Wiley‐Liss, Inc. |
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ISSN: | 1059-910X 1097-0029 |
DOI: | 10.1002/jemt.20583 |