Mitigation of lunar dust adhesion by surface modification

Dust has been recognized as one of the greatest hazards in continued lunar exploration due to its tenacious adhesion to everything with which it comes into contact. Unfortunately, there is little known about the mechanisms of adhesion on widely varying surface types: van der Waals and electrostatic forces are the dominant forces under consideration here. Surface energy, roughness, mechanical properties and electronic properties are all known to contribute to the adhesion characteristics. An optimal solution to mitigate dust adhesion would be to identify the dominant components of the adhesive force and to reduce that force by surface modification. In this study, an ion beam process was used to modify (treat) the surfaces of three dramatically different materials spanning the range of conductor (black Kapton), semiconductor (silicon), and insulator (quartz). Adhesive forces between less than 25 μ m JSC-1 lunar simulants and these virgin/treated surfaces were measured in vacuum using a centrifugal force detachment method. We found that JSC-1 particles adhered less to treated silicon and quartz surfaces, correlated with a reduction in van der Waals force due to a reduced surface energy. The large reduction in adhesion for treated black Kapton is mainly due to the large decrease in the electrostatic (image) force that results from reduced contact charging. Materials in space and on the lunar surface will be directly exposed to high-energy ultraviolet radiation prior to being covered by dust, so the UV irradiation effects on surface adhesion were also examined. Both virgin and treated quartz surfaces are most affected by the UV-irradiation, showing dramatically increased adhesion. ► An ion beam process was used to modify the surfaces of three materials. ► We measure adhesive forces between surfaces and particles by a centrifugal force detachment method. ► Lower adhesion on treated silicon and quartz is correlated with reduced van der Waals forces. ► Lower adhesion on treated black Kapton is due to reduced electrostatic force at particle contact.