Optical and electrical properties of Nd-doped BiFeO3 thin films and heterostructures
High quality BiFeO3 (BFO) and Bi0.9Nd0.1FeO3 (BNFO) thin films (d = 150‐350 nm) were grown at 650‐750°C by RF sputtering on dielectric (SrTiO3; ZrO2) and conducting (Nb‐doped SrTiO3(100); n‐type Si) substrates. A direct band gap at 2.57 eV and 2.62 eV (at T =295 K) have been estimated for the BFO/YS...
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Veröffentlicht in: | Physica status solidi. C 2009-12, Vol.6 (12), p.2746-2749 |
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Sprache: | eng |
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Zusammenfassung: | High quality BiFeO3 (BFO) and Bi0.9Nd0.1FeO3 (BNFO) thin films (d = 150‐350 nm) were grown at 650‐750°C by RF sputtering on dielectric (SrTiO3; ZrO2) and conducting (Nb‐doped SrTiO3(100); n‐type Si) substrates. A direct band gap at 2.57 eV and 2.62 eV (at T =295 K) have been estimated for the BFO/YSZ and BNFO/YSZ films from optical transmittance spectra while an unset of weak absorption has been indicated for the films at 2.20 eV. Transverse electrical transport of the (BFO, BNFO)/(STON, Si) heterostructures revealed nonlinear current versus voltage behavior and clearly defined rectifying properties. Schottky junction model has been applied for the heterojunctions at T =300 K although complicated shape of I‐U curves demonstrated increasing role of space charge limited current with T decreasing down to 78 K. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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ISSN: | 1862-6351 1610-1642 1610-1642 |
DOI: | 10.1002/pssc.200982540 |