Valence band study of LaNiO sub(3- delta ) thin films

The resonant photoemission spectroscopy was used to study the surface electronic structure under la 4d--4f and Ni 3p--3d photo-excitation of thin LaNiO sub(3- delta ) films after annealing in ultrahigh vacuum above dehydration temperature. The giant resonance in la 5p and la 5s peaks intensity obser...

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Veröffentlicht in:Radiation physics and chemistry (Oxford, England : 1993) England : 1993), 2011-10, Vol.80 (10), p.1135-1139
Hauptverfasser: Grebinskij, S, Senulis, M, Tvardauskas, H, Bondarenka, V, Lisauskas, V, Sliuziene, K, Vengalis, B, Orlowski, BA, Johnson, R L, Mickevicius, S
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Sprache:eng
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Zusammenfassung:The resonant photoemission spectroscopy was used to study the surface electronic structure under la 4d--4f and Ni 3p--3d photo-excitation of thin LaNiO sub(3- delta ) films after annealing in ultrahigh vacuum above dehydration temperature. The giant resonance in la 5p and la 5s peaks intensity observed at excitation energy corresponding to a la 4d--4f threshold is accompanied by resonance of the N sub(4,5)O sub(2,3)O sub(2,3) and N sub(4,5)O sub(2,3)V Auger peaks. The enhancement in the intensity of valence band maxima (at about 6 eV) may be explained by the small mixing of the la 5d ionic character to the O 2p valence band. The week resonant features observed in the valence band spectra under Ni 3p--3d threshold indicate the loss of nickel species at the LaNiO sub(3- delta ) film surface after heat treatment.
ISSN:0969-806X
DOI:10.1016/j.radphyschem.2011.02.004