Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies
A contactless and nondestructive technique is employed for characterizing single‐sided metallised silicon wafers. The reflection spectra are measured using a quasi‐optical millmeter‐wave setup in the frequency range 40–320 GHz. The results are compared with those provided by the coplanar waveguide m...
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Veröffentlicht in: | Microwave and optical technology letters 2010-11, Vol.52 (11), p.2500-2505 |
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Sprache: | eng |
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