Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies
A contactless and nondestructive technique is employed for characterizing single‐sided metallised silicon wafers. The reflection spectra are measured using a quasi‐optical millmeter‐wave setup in the frequency range 40–320 GHz. The results are compared with those provided by the coplanar waveguide m...
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| Veröffentlicht in: | Microwave and optical technology letters 2010-11, Vol.52 (11), p.2500-2505 |
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| container_issue | 11 |
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| container_title | Microwave and optical technology letters |
| container_volume | 52 |
| creator | Elhawil, A. Neve, C.Roda Olbrechts, B. Huynen, I. Raskin, J.-P. Poesen, G. Stiens, J. Vounckx, R. |
| description | A contactless and nondestructive technique is employed for characterizing single‐sided metallised silicon wafers. The reflection spectra are measured using a quasi‐optical millmeter‐wave setup in the frequency range 40–320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability. © 2010 Wiley Periodicals, Inc. Microwave Opt Technol Lett 52:2500–2505, 2010; View this article online at wileyonlinelibrary.com. DOI 10.1002/mop.25524 |
| doi_str_mv | 10.1002/mop.25524 |
| format | Article |
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The reflection spectra are measured using a quasi‐optical millmeter‐wave setup in the frequency range 40–320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability. © 2010 Wiley Periodicals, Inc. Microwave Opt Technol Lett 52:2500–2505, 2010; View this article online at wileyonlinelibrary.com. 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DOI 10.1002/mop.25524</description><subject>Coplanar waveguides</subject><subject>Dielectric constant</subject><subject>Microwaves</subject><subject>Monitoring</subject><subject>nondestructive extraction method</subject><subject>On-line systems</subject><subject>Permittivity</subject><subject>quasi-optical</subject><subject>Reflection</subject><subject>resistivity measurement</subject><subject>semiconductors</subject><subject>silicon</subject><subject>Spectra</subject><issn>0895-2477</issn><issn>1098-2760</issn><issn>1098-2760</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp1kE1P3DAQhq0KpC7QQ_-Bb4hDwB_JOj5WK1iQtgVBq_ZmTeJxZZrEi-0F9t_XZSk3TqMZPe-M5iHkM2ennDFxNob1qWgaUX8gM850Wwk1Z3tkxlrdVKJW6iM5SOmeMSaVEjPysAhThj4PmBIdw-RziH76TYOjd56mTZdyhIx0jXH0OftHn7cUJksjJp9eexfDSEffx_AEj0hzKM0w-BEzRvoychEfNjj1HtMR2XcwJPz0Wg_Jj4vz74vLanW9vFp8WVW9lLqubNdbbZ2Q2FkH0HIHstOt7IVitnMWpNAWUPCm5qC47VVXXrKoQYJuWpCH5Hi3dx1DuZ2yGX3qcRhgwrBJRjM-nxdTvJAnO7I8kFJEZ9bRjxC3hjPzz6opVs2L1cKe7dgnP-D2fdB8vb75n6h2iaILn98SEP-YuZKqMT-_LY24Ze0vuVyZWv4FYaWM_A</recordid><startdate>201011</startdate><enddate>201011</enddate><creator>Elhawil, A.</creator><creator>Neve, C.Roda</creator><creator>Olbrechts, B.</creator><creator>Huynen, I.</creator><creator>Raskin, J.-P.</creator><creator>Poesen, G.</creator><creator>Stiens, J.</creator><creator>Vounckx, R.</creator><general>Wiley Subscription Services, Inc., A Wiley Company</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>201011</creationdate><title>Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies</title><author>Elhawil, A. ; Neve, C.Roda ; Olbrechts, B. ; Huynen, I. ; Raskin, J.-P. ; Poesen, G. ; Stiens, J. ; Vounckx, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3394-dbcd9df23ebdfaa81fa3b983c270dbfda329dae21541a71dc7b037de9a3a958a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Coplanar waveguides</topic><topic>Dielectric constant</topic><topic>Microwaves</topic><topic>Monitoring</topic><topic>nondestructive extraction method</topic><topic>On-line systems</topic><topic>Permittivity</topic><topic>quasi-optical</topic><topic>Reflection</topic><topic>resistivity measurement</topic><topic>semiconductors</topic><topic>silicon</topic><topic>Spectra</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Elhawil, A.</creatorcontrib><creatorcontrib>Neve, C.Roda</creatorcontrib><creatorcontrib>Olbrechts, B.</creatorcontrib><creatorcontrib>Huynen, I.</creatorcontrib><creatorcontrib>Raskin, J.-P.</creatorcontrib><creatorcontrib>Poesen, G.</creatorcontrib><creatorcontrib>Stiens, J.</creatorcontrib><creatorcontrib>Vounckx, R.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microwave and optical technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Elhawil, A.</au><au>Neve, C.Roda</au><au>Olbrechts, B.</au><au>Huynen, I.</au><au>Raskin, J.-P.</au><au>Poesen, G.</au><au>Stiens, J.</au><au>Vounckx, R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies</atitle><jtitle>Microwave and optical technology letters</jtitle><addtitle>Microw. Opt. Technol. Lett</addtitle><date>2010-11</date><risdate>2010</risdate><volume>52</volume><issue>11</issue><spage>2500</spage><epage>2505</epage><pages>2500-2505</pages><issn>0895-2477</issn><issn>1098-2760</issn><eissn>1098-2760</eissn><abstract>A contactless and nondestructive technique is employed for characterizing single‐sided metallised silicon wafers. The reflection spectra are measured using a quasi‐optical millmeter‐wave setup in the frequency range 40–320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability. © 2010 Wiley Periodicals, Inc. Microwave Opt Technol Lett 52:2500–2505, 2010; View this article online at wileyonlinelibrary.com. DOI 10.1002/mop.25524</abstract><cop>Hoboken</cop><pub>Wiley Subscription Services, Inc., A Wiley Company</pub><doi>10.1002/mop.25524</doi><tpages>6</tpages></addata></record> |
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| language | eng |
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| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Coplanar waveguides Dielectric constant Microwaves Monitoring nondestructive extraction method On-line systems Permittivity quasi-optical Reflection resistivity measurement semiconductors silicon Spectra |
| title | Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies |
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