Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy
Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazin...
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Veröffentlicht in: | Carbon (New York) 2009, Vol.47 (1), p.145-152 |
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container_title | Carbon (New York) |
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creator | Yang, Dongxing Velamakanni, Aruna Bozoklu, Gülay Park, Sungjin Stoller, Meryl Piner, Richard D. Stankovich, Sasha Jung, Inhwa Field, Daniel A. Ventrice, Carl A. Ruoff, Rodney S. |
description | Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70
°C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content. |
doi_str_mv | 10.1016/j.carbon.2008.09.045 |
format | Article |
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°C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.</description><subject>Argon</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Exposure</subject><subject>Fullerenes and related materials; diamonds, graphite</subject><subject>Graphene</subject><subject>Heat treatment</subject><subject>Materials science</subject><subject>Oxide coatings</subject><subject>Oxygen content</subject><subject>Physics</subject><subject>Silicon substrates</subject><subject>Specific materials</subject><subject>X-rays</subject><issn>0008-6223</issn><issn>1873-3891</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9kU9v1DAQxS0EEkvLN-DgC3BK8L84yQUJrQqtVFSpKhI3a9YZs14ldrBTRG58dLzdwrEny36_mfG8R8gbzmrOuP5wqC2kXQy1YKyrWV8z1TwjG961spJdz5-TDStKpYWQL8mrnA_lqjquNuTPdo-TtzBSCDCu2WcaHf2RYN5jQBp_-wGp8-OUKbgFE90jLIUdqP1XuKTyNGFYMt2t9HuVYKXzPi4RR7RLiuEB_-ptitUtTBBonh-EbOO8npMXDsaMrx_PM_Lt88Xd9rK6vvlytf10XVmlm6UCraUr64m-7UE02EslQDWCI9iGqVYPbpBFtmIQwOXAJIpd2wlwcmet0_KMvD_1nVP8eY95MZPPFscRAsb7bPpipBZKy0K-e5KUjeiU6poCqhNYNss5oTNz8hOk1XBmjsGYgzkFY47BGNabEkwpe_vYH3LxzyUI1uf_tYKzVnJ-_MfHE4fFll8ek8nWY7A4-FT8M0P0Tw_6C3Oopyw</recordid><startdate>2009</startdate><enddate>2009</enddate><creator>Yang, Dongxing</creator><creator>Velamakanni, Aruna</creator><creator>Bozoklu, Gülay</creator><creator>Park, Sungjin</creator><creator>Stoller, Meryl</creator><creator>Piner, Richard D.</creator><creator>Stankovich, Sasha</creator><creator>Jung, Inhwa</creator><creator>Field, Daniel A.</creator><creator>Ventrice, Carl A.</creator><creator>Ruoff, Rodney S.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>2009</creationdate><title>Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy</title><author>Yang, Dongxing ; 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°C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.</abstract><cop>Kidlington</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.carbon.2008.09.045</doi><tpages>8</tpages></addata></record> |
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subjects | Argon Cross-disciplinary physics: materials science rheology Exact sciences and technology Exposure Fullerenes and related materials diamonds, graphite Graphene Heat treatment Materials science Oxide coatings Oxygen content Physics Silicon substrates Specific materials X-rays |
title | Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy |
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