Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy

Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazin...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Carbon (New York) 2009, Vol.47 (1), p.145-152
Hauptverfasser: Yang, Dongxing, Velamakanni, Aruna, Bozoklu, Gülay, Park, Sungjin, Stoller, Meryl, Piner, Richard D., Stankovich, Sasha, Jung, Inhwa, Field, Daniel A., Ventrice, Carl A., Ruoff, Rodney S.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 152
container_issue 1
container_start_page 145
container_title Carbon (New York)
container_volume 47
creator Yang, Dongxing
Velamakanni, Aruna
Bozoklu, Gülay
Park, Sungjin
Stoller, Meryl
Piner, Richard D.
Stankovich, Sasha
Jung, Inhwa
Field, Daniel A.
Ventrice, Carl A.
Ruoff, Rodney S.
description Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.
doi_str_mv 10.1016/j.carbon.2008.09.045
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_901662463</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0008622308005022</els_id><sourcerecordid>901662463</sourcerecordid><originalsourceid>FETCH-LOGICAL-c465t-a663f2002979a25e9342a4521eac50476dfd3002c2d2a13d03e2b782af3bccf63</originalsourceid><addsrcrecordid>eNp9kU9v1DAQxS0EEkvLN-DgC3BK8L84yQUJrQqtVFSpKhI3a9YZs14ldrBTRG58dLzdwrEny36_mfG8R8gbzmrOuP5wqC2kXQy1YKyrWV8z1TwjG961spJdz5-TDStKpYWQL8mrnA_lqjquNuTPdo-TtzBSCDCu2WcaHf2RYN5jQBp_-wGp8-OUKbgFE90jLIUdqP1XuKTyNGFYMt2t9HuVYKXzPi4RR7RLiuEB_-ptitUtTBBonh-EbOO8npMXDsaMrx_PM_Lt88Xd9rK6vvlytf10XVmlm6UCraUr64m-7UE02EslQDWCI9iGqVYPbpBFtmIQwOXAJIpd2wlwcmet0_KMvD_1nVP8eY95MZPPFscRAsb7bPpipBZKy0K-e5KUjeiU6poCqhNYNss5oTNz8hOk1XBmjsGYgzkFY47BGNabEkwpe_vYH3LxzyUI1uf_tYKzVnJ-_MfHE4fFll8ek8nWY7A4-FT8M0P0Tw_6C3Oopyw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>35284485</pqid></control><display><type>article</type><title>Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy</title><source>Elsevier ScienceDirect Journals</source><creator>Yang, Dongxing ; Velamakanni, Aruna ; Bozoklu, Gülay ; Park, Sungjin ; Stoller, Meryl ; Piner, Richard D. ; Stankovich, Sasha ; Jung, Inhwa ; Field, Daniel A. ; Ventrice, Carl A. ; Ruoff, Rodney S.</creator><creatorcontrib>Yang, Dongxing ; Velamakanni, Aruna ; Bozoklu, Gülay ; Park, Sungjin ; Stoller, Meryl ; Piner, Richard D. ; Stankovich, Sasha ; Jung, Inhwa ; Field, Daniel A. ; Ventrice, Carl A. ; Ruoff, Rodney S.</creatorcontrib><description>Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.</description><identifier>ISSN: 0008-6223</identifier><identifier>EISSN: 1873-3891</identifier><identifier>DOI: 10.1016/j.carbon.2008.09.045</identifier><identifier>CODEN: CRBNAH</identifier><language>eng</language><publisher>Kidlington: Elsevier Ltd</publisher><subject>Argon ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Exposure ; Fullerenes and related materials; diamonds, graphite ; Graphene ; Heat treatment ; Materials science ; Oxide coatings ; Oxygen content ; Physics ; Silicon substrates ; Specific materials ; X-rays</subject><ispartof>Carbon (New York), 2009, Vol.47 (1), p.145-152</ispartof><rights>2008 Elsevier Ltd</rights><rights>2009 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c465t-a663f2002979a25e9342a4521eac50476dfd3002c2d2a13d03e2b782af3bccf63</citedby><cites>FETCH-LOGICAL-c465t-a663f2002979a25e9342a4521eac50476dfd3002c2d2a13d03e2b782af3bccf63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0008622308005022$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,4010,27902,27903,27904,65309</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=21073113$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Yang, Dongxing</creatorcontrib><creatorcontrib>Velamakanni, Aruna</creatorcontrib><creatorcontrib>Bozoklu, Gülay</creatorcontrib><creatorcontrib>Park, Sungjin</creatorcontrib><creatorcontrib>Stoller, Meryl</creatorcontrib><creatorcontrib>Piner, Richard D.</creatorcontrib><creatorcontrib>Stankovich, Sasha</creatorcontrib><creatorcontrib>Jung, Inhwa</creatorcontrib><creatorcontrib>Field, Daniel A.</creatorcontrib><creatorcontrib>Ventrice, Carl A.</creatorcontrib><creatorcontrib>Ruoff, Rodney S.</creatorcontrib><title>Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy</title><title>Carbon (New York)</title><description>Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.</description><subject>Argon</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Exposure</subject><subject>Fullerenes and related materials; diamonds, graphite</subject><subject>Graphene</subject><subject>Heat treatment</subject><subject>Materials science</subject><subject>Oxide coatings</subject><subject>Oxygen content</subject><subject>Physics</subject><subject>Silicon substrates</subject><subject>Specific materials</subject><subject>X-rays</subject><issn>0008-6223</issn><issn>1873-3891</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9kU9v1DAQxS0EEkvLN-DgC3BK8L84yQUJrQqtVFSpKhI3a9YZs14ldrBTRG58dLzdwrEny36_mfG8R8gbzmrOuP5wqC2kXQy1YKyrWV8z1TwjG961spJdz5-TDStKpYWQL8mrnA_lqjquNuTPdo-TtzBSCDCu2WcaHf2RYN5jQBp_-wGp8-OUKbgFE90jLIUdqP1XuKTyNGFYMt2t9HuVYKXzPi4RR7RLiuEB_-ptitUtTBBonh-EbOO8npMXDsaMrx_PM_Lt88Xd9rK6vvlytf10XVmlm6UCraUr64m-7UE02EslQDWCI9iGqVYPbpBFtmIQwOXAJIpd2wlwcmet0_KMvD_1nVP8eY95MZPPFscRAsb7bPpipBZKy0K-e5KUjeiU6poCqhNYNss5oTNz8hOk1XBmjsGYgzkFY47BGNabEkwpe_vYH3LxzyUI1uf_tYKzVnJ-_MfHE4fFll8ek8nWY7A4-FT8M0P0Tw_6C3Oopyw</recordid><startdate>2009</startdate><enddate>2009</enddate><creator>Yang, Dongxing</creator><creator>Velamakanni, Aruna</creator><creator>Bozoklu, Gülay</creator><creator>Park, Sungjin</creator><creator>Stoller, Meryl</creator><creator>Piner, Richard D.</creator><creator>Stankovich, Sasha</creator><creator>Jung, Inhwa</creator><creator>Field, Daniel A.</creator><creator>Ventrice, Carl A.</creator><creator>Ruoff, Rodney S.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>2009</creationdate><title>Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy</title><author>Yang, Dongxing ; Velamakanni, Aruna ; Bozoklu, Gülay ; Park, Sungjin ; Stoller, Meryl ; Piner, Richard D. ; Stankovich, Sasha ; Jung, Inhwa ; Field, Daniel A. ; Ventrice, Carl A. ; Ruoff, Rodney S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c465t-a663f2002979a25e9342a4521eac50476dfd3002c2d2a13d03e2b782af3bccf63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Argon</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Exposure</topic><topic>Fullerenes and related materials; diamonds, graphite</topic><topic>Graphene</topic><topic>Heat treatment</topic><topic>Materials science</topic><topic>Oxide coatings</topic><topic>Oxygen content</topic><topic>Physics</topic><topic>Silicon substrates</topic><topic>Specific materials</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yang, Dongxing</creatorcontrib><creatorcontrib>Velamakanni, Aruna</creatorcontrib><creatorcontrib>Bozoklu, Gülay</creatorcontrib><creatorcontrib>Park, Sungjin</creatorcontrib><creatorcontrib>Stoller, Meryl</creatorcontrib><creatorcontrib>Piner, Richard D.</creatorcontrib><creatorcontrib>Stankovich, Sasha</creatorcontrib><creatorcontrib>Jung, Inhwa</creatorcontrib><creatorcontrib>Field, Daniel A.</creatorcontrib><creatorcontrib>Ventrice, Carl A.</creatorcontrib><creatorcontrib>Ruoff, Rodney S.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Carbon (New York)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yang, Dongxing</au><au>Velamakanni, Aruna</au><au>Bozoklu, Gülay</au><au>Park, Sungjin</au><au>Stoller, Meryl</au><au>Piner, Richard D.</au><au>Stankovich, Sasha</au><au>Jung, Inhwa</au><au>Field, Daniel A.</au><au>Ventrice, Carl A.</au><au>Ruoff, Rodney S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy</atitle><jtitle>Carbon (New York)</jtitle><date>2009</date><risdate>2009</risdate><volume>47</volume><issue>1</issue><spage>145</spage><epage>152</epage><pages>145-152</pages><issn>0008-6223</issn><eissn>1873-3891</eissn><coden>CRBNAH</coden><abstract>Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.</abstract><cop>Kidlington</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.carbon.2008.09.045</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0008-6223
ispartof Carbon (New York), 2009, Vol.47 (1), p.145-152
issn 0008-6223
1873-3891
language eng
recordid cdi_proquest_miscellaneous_901662463
source Elsevier ScienceDirect Journals
subjects Argon
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Exposure
Fullerenes and related materials
diamonds, graphite
Graphene
Heat treatment
Materials science
Oxide coatings
Oxygen content
Physics
Silicon substrates
Specific materials
X-rays
title Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T11%3A00%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Chemical%20analysis%20of%20graphene%20oxide%20films%20after%20heat%20and%20chemical%20treatments%20by%20X-ray%20photoelectron%20and%20Micro-Raman%20spectroscopy&rft.jtitle=Carbon%20(New%20York)&rft.au=Yang,%20Dongxing&rft.date=2009&rft.volume=47&rft.issue=1&rft.spage=145&rft.epage=152&rft.pages=145-152&rft.issn=0008-6223&rft.eissn=1873-3891&rft.coden=CRBNAH&rft_id=info:doi/10.1016/j.carbon.2008.09.045&rft_dat=%3Cproquest_cross%3E901662463%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=35284485&rft_id=info:pmid/&rft_els_id=S0008622308005022&rfr_iscdi=true