Neon Ion Beam Lithography (NIBL)

Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence

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Bibliographische Detailangaben
Veröffentlicht in:	Nano Letters 2011-10, Vol.11 (10), p.4343-4347
Hauptverfasser:	Winston, Donald, Manfrinato, Vitor R, Nicaise, Samuel M, Cheong, Lin Lee, Duan, Huigao, Ferranti, David, Marshman, Jeff, McVey, Shawn, Stern, Lewis, Notte, John, Berggren, Karl K
Format:	Artikel
Sprache:	eng
Schlagworte:	Arrays Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Exposure Fluence Ion beams Lithography Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Molds Nanostructure Neon Physics Prototyping solar (photovoltaic), solid state lighting, photosynthesis (natural and artificial), charge transport, optics, synthesis (novel materials), synthesis (self-assembly), synthesis (scalable processing) Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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Beschreibung
Zusammenfassung:	Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence
ISSN:	1530-6984 1530-6992
DOI:	10.1021/nl202447n