In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled...

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Veröffentlicht in:Nano letters 2011-10, Vol.11 (10), p.4154-4160
Hauptverfasser: Weatherup, Robert S, Bayer, Bernhard C, Blume, Raoul, Ducati, Caterina, Baehtz, Carsten, Schlögl, Robert, Hofmann, Stephan
Format: Artikel
Sprache:eng
Schlagworte:
Admixtures
Alloy development
Catalysis
Catalysts
Catalytic methods
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Density
Diffraction
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
Graphene
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Methods of nanofabrication
Nucleation
Physics
Specific materials
X-rays
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Zusammenfassung:Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl202036y