Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses

Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss o...

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Veröffentlicht in:Journal of lightwave technology 2005-11, Vol.23 (11), p.3875-3880
Hauptverfasser: Solehmainen, K., Aalto, T., Dekker, J., Kapulainen, M., Harjanne, M., Kukli, K., Heimala, P., Kolari, K., Leskela, M.
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Sprache:eng
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Zusammenfassung:Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2005.857750