Processing of hollow micro- and nanostructures using the hydrophilic nature of MgO

We show that covering the water-saturated MgO surface with an Al 2O 3 film using atomic layer deposition and then annealing it at 400 °C leads to plastic deformation of alumina by trapped water vapor with consequent development of hollow structures. This phenomenon is applied to thin films, nanopatt...

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Veröffentlicht in:	Precision engineering 2011-07, Vol.35 (3), p.496-499
Hauptverfasser:	Zolotaryov, A., Bachmann, J., Montero-Moreno, J.M., Pitzschel, K., Nielsch, K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum oxide Applied sciences Atomic layer deposition Atomic structure Cross-disciplinary physics: materials science rheology Deposition Electronics Exact sciences and technology Heat treatment Hollow nanostructures Lithography Magnesium oxide Materials science Methods of deposition of films and coatings film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Nanocomposites Nanomaterials Nanostructure Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Three dimensional
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Beschreibung
Zusammenfassung:	We show that covering the water-saturated MgO surface with an Al 2O 3 film using atomic layer deposition and then annealing it at 400 °C leads to plastic deformation of alumina by trapped water vapor with consequent development of hollow structures. This phenomenon is applied to thin films, nanopatterned surfaces and isolated 3D nanostructures.
ISSN:	0141-6359 1873-2372
DOI:	10.1016/j.precisioneng.2011.03.005