Importance of kinetics effects in the growth of germanium nanowires by vapour–liquid–solid Molecular Beam Epitaxy

Germanium nanowires with diameters from 10 to 70nm and lengths up to 3μm have been grown by Vapour–Liquid–Solid Molecular Beam Epitaxy (VLS MBE) on Ge (111), Si (001) and Si (110) substrates. The growth of nanowires was induced by gold droplets. We show that substrate temperature and germanium depos...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of crystal growth 2011-05, Vol.323 (1), p.334-339
Hauptverfasser: Porret, C., Devillers, T., Jain, A., Dujardin, R., Barski, A.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Germanium nanowires with diameters from 10 to 70nm and lengths up to 3μm have been grown by Vapour–Liquid–Solid Molecular Beam Epitaxy (VLS MBE) on Ge (111), Si (001) and Si (110) substrates. The growth of nanowires was induced by gold droplets. We show that substrate temperature and germanium deposition rate, which determine surface diffusion length, are key parameters governing nanowires nucleation and growth phenomena. We also show that nanowires growth directions are independent of the strain induced by lattice mismatch.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2010.11.056