DC performance of InP/InGaAs p-n-p heterostructure-emitter bipolar transistor
The dc performance of a novel InP/InGaAs p-n-p heterostructure-emitter bipolar transistor is first demonstrated. Though the valence band discontinuity at an InP/InGaAs heterojunction is relatively large, the addition of a heavy doped as well as thin p/sup +/-InGaAs emitter layer between a p-InP conf...
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Veröffentlicht in: | IEEE transactions on electron devices 2006-05, Vol.53 (5), p.1265-1267 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The dc performance of a novel InP/InGaAs p-n-p heterostructure-emitter bipolar transistor is first demonstrated. Though the valence band discontinuity at an InP/InGaAs heterojunction is relatively large, the addition of a heavy doped as well as thin p/sup +/-InGaAs emitter layer between a p-InP confinement and n/sup +/-InGaAs base layers effectively eliminates the potential spike at emitter-base junction, lowers the emitter-collector offset voltage, and increases the barrier for electrons, simultaneously. Experimentally, a high current gain of 88 and a low offset voltage of 54 mV are achieved. To the author's knowledge, the offset voltage of the studied device is the lowest value among of the InP/InGaAs p-n-p heterojunction bipolar transistors. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2006.872691 |