DC performance of InP/InGaAs p-n-p heterostructure-emitter bipolar transistor

The dc performance of a novel InP/InGaAs p-n-p heterostructure-emitter bipolar transistor is first demonstrated. Though the valence band discontinuity at an InP/InGaAs heterojunction is relatively large, the addition of a heavy doped as well as thin p/sup +/-InGaAs emitter layer between a p-InP conf...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2006-05, Vol.53 (5), p.1265-1267
Hauptverfasser: TSAI, Jung-Hui, KANG, Yu-Chi
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The dc performance of a novel InP/InGaAs p-n-p heterostructure-emitter bipolar transistor is first demonstrated. Though the valence band discontinuity at an InP/InGaAs heterojunction is relatively large, the addition of a heavy doped as well as thin p/sup +/-InGaAs emitter layer between a p-InP confinement and n/sup +/-InGaAs base layers effectively eliminates the potential spike at emitter-base junction, lowers the emitter-collector offset voltage, and increases the barrier for electrons, simultaneously. Experimentally, a high current gain of 88 and a low offset voltage of 54 mV are achieved. To the author's knowledge, the offset voltage of the studied device is the lowest value among of the InP/InGaAs p-n-p heterojunction bipolar transistors.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2006.872691