Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride

Silicon (Si) nanoparticles (NPs) were synthesized by transforming a Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH(4))(2)SiF(6) under acid vapor treatment. Si-NPs which were found to be embedded within the polycrystalline (ASH) layer exhibit a strong green-orange photoluminescence (P...

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Veröffentlicht in:Nanotechnology 2010-10, Vol.21 (43), p.435701-435701
Hauptverfasser: Kalem, Seref, Werner, Peter, Talalaev, Vadim, Becker, Michael, Arthursson, Örjan, Zakharov, Nikolai
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container_end_page 435701
container_issue 43
container_start_page 435701
container_title Nanotechnology
container_volume 21
creator Kalem, Seref
Werner, Peter
Talalaev, Vadim
Becker, Michael
Arthursson, Örjan
Zakharov, Nikolai
description Silicon (Si) nanoparticles (NPs) were synthesized by transforming a Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH(4))(2)SiF(6) under acid vapor treatment. Si-NPs which were found to be embedded within the polycrystalline (ASH) layer exhibit a strong green-orange photoluminescence (PL). Differential PL measurements revealed a major double component spectrum consisting of a broad band associated with the ASH-Si wafer interfacial porous oxide layer and a high energy band attributable to Si-NPs embedded in the ASH. The origin of the latter emission can be explained in terms of quantum/spatial confinement effects probably mediated by oxygen related defects in or around Si-NPs. Although Si-NPs are derived from the interface they are much smaller in size than those embedded within the interfacial porous oxide layer (SiO(x), x > 1.5). Transmission electron microscopy (TEM) combined with Raman scattering and Fourier transformed infrared (FTIR) analysis confirmed the presence of Si-NP and Si-O bondings pointing to the role of oxygen related defects in a porous/amorphous structure. The presence of oxygen of up to 4.5 at.% in the (NH(4))(2)SiF(6) layer was confirmed by energy dispersive spectroscopy (EDS) analysis.
doi_str_mv 10.1088/0957-4484/21/43/435701
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fullrecord <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_proquest_miscellaneous_880676407</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>880676407</sourcerecordid><originalsourceid>FETCH-LOGICAL-c498t-33aec54a687e55c1c25efa83743d74fa54a2daa5bf3faeeb897be555bf5bfc853</originalsourceid><addsrcrecordid>eNqFkU2LFDEQhoMo7uzqX1j65qmdfCd9lEVXYWEFP66hOl1hIt2dNplG_fdm6HU8KCwUhFBPvSnyEHLN6GtGrd3TTplWSiv3nO2lqKUMZU_IjgnNWq24fUp2Z-iCXJbyjVLGLGfPyQWn1ujO8h35-vGQjmlcpzhj8Th7bEJOU1PiGH2amxnmtEA-Rj9iaXDqcRhwaOLcwDSlOa5_0QP-hDCuKccBX5BnAcaCLx_OK_Ll3dvPN-_bu_vbDzdv7lovO3tshQD0SoK2BpXyzHOFAawwUgxGBqgtPgCoPogAiL3tTF_Beq_lrRJX5NOWW37gsvZuyXGC_MsliC5jQcj-4PwBxglzcQUdhL7nqIxDbaWTQXgHA-2c6KhmFKy2qq-pr7bUJafvK5ajm2L9nHGEGdNanLVUGy2peZQ0SmvNteWV1BvpcyolYzjvyqg7KXUnW-5ky3HmpHCb0jp4_fDE2k84nMf-OKxAuwExLefu_8PcMoTKs3_5R5b4DRqnuzw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>756662682</pqid></control><display><type>article</type><title>Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Kalem, Seref ; Werner, Peter ; Talalaev, Vadim ; Becker, Michael ; Arthursson, Örjan ; Zakharov, Nikolai</creator><creatorcontrib>Kalem, Seref ; Werner, Peter ; Talalaev, Vadim ; Becker, Michael ; Arthursson, Örjan ; Zakharov, Nikolai</creatorcontrib><description>Silicon (Si) nanoparticles (NPs) were synthesized by transforming a Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH(4))(2)SiF(6) under acid vapor treatment. Si-NPs which were found to be embedded within the polycrystalline (ASH) layer exhibit a strong green-orange photoluminescence (PL). Differential PL measurements revealed a major double component spectrum consisting of a broad band associated with the ASH-Si wafer interfacial porous oxide layer and a high energy band attributable to Si-NPs embedded in the ASH. The origin of the latter emission can be explained in terms of quantum/spatial confinement effects probably mediated by oxygen related defects in or around Si-NPs. Although Si-NPs are derived from the interface they are much smaller in size than those embedded within the interfacial porous oxide layer (SiO(x), x &gt; 1.5). Transmission electron microscopy (TEM) combined with Raman scattering and Fourier transformed infrared (FTIR) analysis confirmed the presence of Si-NP and Si-O bondings pointing to the role of oxygen related defects in a porous/amorphous structure. The presence of oxygen of up to 4.5 at.% in the (NH(4))(2)SiF(6) layer was confirmed by energy dispersive spectroscopy (EDS) analysis.</description><identifier>ISSN: 0957-4484</identifier><identifier>ISSN: 1361-6528</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/21/43/435701</identifier><identifier>PMID: 20876982</identifier><language>eng</language><publisher>England: IOP Publishing</publisher><subject>Ashes ; Defects ; electronic states ; etching technique ; interface ; luminescence properties ; Nanoparticles ; Nanotechnology ; optical-properties ; Oxides ; phase-transition ; Photoluminescence ; porous silicon ; quantum confinement ; si nanocrystals ; Silicon ; Wafers</subject><ispartof>Nanotechnology, 2010-10, Vol.21 (43), p.435701-435701</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c498t-33aec54a687e55c1c25efa83743d74fa54a2daa5bf3faeeb897be555bf5bfc853</citedby><cites>FETCH-LOGICAL-c498t-33aec54a687e55c1c25efa83743d74fa54a2daa5bf3faeeb897be555bf5bfc853</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0957-4484/21/43/435701/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>230,314,778,782,883,27911,27912,53817,53897</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/20876982$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://research.chalmers.se/publication/128091$$DView record from Swedish Publication Index$$Hfree_for_read</backlink></links><search><creatorcontrib>Kalem, Seref</creatorcontrib><creatorcontrib>Werner, Peter</creatorcontrib><creatorcontrib>Talalaev, Vadim</creatorcontrib><creatorcontrib>Becker, Michael</creatorcontrib><creatorcontrib>Arthursson, Örjan</creatorcontrib><creatorcontrib>Zakharov, Nikolai</creatorcontrib><title>Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride</title><title>Nanotechnology</title><addtitle>Nanotechnology</addtitle><description>Silicon (Si) nanoparticles (NPs) were synthesized by transforming a Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH(4))(2)SiF(6) under acid vapor treatment. Si-NPs which were found to be embedded within the polycrystalline (ASH) layer exhibit a strong green-orange photoluminescence (PL). Differential PL measurements revealed a major double component spectrum consisting of a broad band associated with the ASH-Si wafer interfacial porous oxide layer and a high energy band attributable to Si-NPs embedded in the ASH. The origin of the latter emission can be explained in terms of quantum/spatial confinement effects probably mediated by oxygen related defects in or around Si-NPs. Although Si-NPs are derived from the interface they are much smaller in size than those embedded within the interfacial porous oxide layer (SiO(x), x &gt; 1.5). Transmission electron microscopy (TEM) combined with Raman scattering and Fourier transformed infrared (FTIR) analysis confirmed the presence of Si-NP and Si-O bondings pointing to the role of oxygen related defects in a porous/amorphous structure. The presence of oxygen of up to 4.5 at.% in the (NH(4))(2)SiF(6) layer was confirmed by energy dispersive spectroscopy (EDS) analysis.</description><subject>Ashes</subject><subject>Defects</subject><subject>electronic states</subject><subject>etching technique</subject><subject>interface</subject><subject>luminescence properties</subject><subject>Nanoparticles</subject><subject>Nanotechnology</subject><subject>optical-properties</subject><subject>Oxides</subject><subject>phase-transition</subject><subject>Photoluminescence</subject><subject>porous silicon</subject><subject>quantum confinement</subject><subject>si nanocrystals</subject><subject>Silicon</subject><subject>Wafers</subject><issn>0957-4484</issn><issn>1361-6528</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqFkU2LFDEQhoMo7uzqX1j65qmdfCd9lEVXYWEFP66hOl1hIt2dNplG_fdm6HU8KCwUhFBPvSnyEHLN6GtGrd3TTplWSiv3nO2lqKUMZU_IjgnNWq24fUp2Z-iCXJbyjVLGLGfPyQWn1ujO8h35-vGQjmlcpzhj8Th7bEJOU1PiGH2amxnmtEA-Rj9iaXDqcRhwaOLcwDSlOa5_0QP-hDCuKccBX5BnAcaCLx_OK_Ll3dvPN-_bu_vbDzdv7lovO3tshQD0SoK2BpXyzHOFAawwUgxGBqgtPgCoPogAiL3tTF_Beq_lrRJX5NOWW37gsvZuyXGC_MsliC5jQcj-4PwBxglzcQUdhL7nqIxDbaWTQXgHA-2c6KhmFKy2qq-pr7bUJafvK5ajm2L9nHGEGdNanLVUGy2peZQ0SmvNteWV1BvpcyolYzjvyqg7KXUnW-5ky3HmpHCb0jp4_fDE2k84nMf-OKxAuwExLefu_8PcMoTKs3_5R5b4DRqnuzw</recordid><startdate>20101029</startdate><enddate>20101029</enddate><creator>Kalem, Seref</creator><creator>Werner, Peter</creator><creator>Talalaev, Vadim</creator><creator>Becker, Michael</creator><creator>Arthursson, Örjan</creator><creator>Zakharov, Nikolai</creator><general>IOP Publishing</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope><scope>ADTPV</scope><scope>AOWAS</scope><scope>F1S</scope></search><sort><creationdate>20101029</creationdate><title>Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride</title><author>Kalem, Seref ; Werner, Peter ; Talalaev, Vadim ; Becker, Michael ; Arthursson, Örjan ; Zakharov, Nikolai</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c498t-33aec54a687e55c1c25efa83743d74fa54a2daa5bf3faeeb897be555bf5bfc853</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Ashes</topic><topic>Defects</topic><topic>electronic states</topic><topic>etching technique</topic><topic>interface</topic><topic>luminescence properties</topic><topic>Nanoparticles</topic><topic>Nanotechnology</topic><topic>optical-properties</topic><topic>Oxides</topic><topic>phase-transition</topic><topic>Photoluminescence</topic><topic>porous silicon</topic><topic>quantum confinement</topic><topic>si nanocrystals</topic><topic>Silicon</topic><topic>Wafers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kalem, Seref</creatorcontrib><creatorcontrib>Werner, Peter</creatorcontrib><creatorcontrib>Talalaev, Vadim</creatorcontrib><creatorcontrib>Becker, Michael</creatorcontrib><creatorcontrib>Arthursson, Örjan</creatorcontrib><creatorcontrib>Zakharov, Nikolai</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>SwePub</collection><collection>SwePub Articles</collection><collection>SWEPUB Chalmers tekniska högskola</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kalem, Seref</au><au>Werner, Peter</au><au>Talalaev, Vadim</au><au>Becker, Michael</au><au>Arthursson, Örjan</au><au>Zakharov, Nikolai</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride</atitle><jtitle>Nanotechnology</jtitle><addtitle>Nanotechnology</addtitle><date>2010-10-29</date><risdate>2010</risdate><volume>21</volume><issue>43</issue><spage>435701</spage><epage>435701</epage><pages>435701-435701</pages><issn>0957-4484</issn><issn>1361-6528</issn><eissn>1361-6528</eissn><abstract>Silicon (Si) nanoparticles (NPs) were synthesized by transforming a Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH(4))(2)SiF(6) under acid vapor treatment. Si-NPs which were found to be embedded within the polycrystalline (ASH) layer exhibit a strong green-orange photoluminescence (PL). Differential PL measurements revealed a major double component spectrum consisting of a broad band associated with the ASH-Si wafer interfacial porous oxide layer and a high energy band attributable to Si-NPs embedded in the ASH. The origin of the latter emission can be explained in terms of quantum/spatial confinement effects probably mediated by oxygen related defects in or around Si-NPs. Although Si-NPs are derived from the interface they are much smaller in size than those embedded within the interfacial porous oxide layer (SiO(x), x &gt; 1.5). Transmission electron microscopy (TEM) combined with Raman scattering and Fourier transformed infrared (FTIR) analysis confirmed the presence of Si-NP and Si-O bondings pointing to the role of oxygen related defects in a porous/amorphous structure. The presence of oxygen of up to 4.5 at.% in the (NH(4))(2)SiF(6) layer was confirmed by energy dispersive spectroscopy (EDS) analysis.</abstract><cop>England</cop><pub>IOP Publishing</pub><pmid>20876982</pmid><doi>10.1088/0957-4484/21/43/435701</doi><tpages>1</tpages></addata></record>
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Ashes
Defects
electronic states
etching technique
interface
luminescence properties
Nanoparticles
Nanotechnology
optical-properties
Oxides
phase-transition
Photoluminescence
porous silicon
quantum confinement
si nanocrystals
Silicon
Wafers
title Photoluminescence from silicon nanoparticles embedded in ammonium silicon hexafluoride
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T17%3A35%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Photoluminescence%20from%20silicon%20nanoparticles%20embedded%20in%20ammonium%20silicon%20hexafluoride&rft.jtitle=Nanotechnology&rft.au=Kalem,%20Seref&rft.date=2010-10-29&rft.volume=21&rft.issue=43&rft.spage=435701&rft.epage=435701&rft.pages=435701-435701&rft.issn=0957-4484&rft.eissn=1361-6528&rft_id=info:doi/10.1088/0957-4484/21/43/435701&rft_dat=%3Cproquest_pubme%3E880676407%3C/proquest_pubme%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=756662682&rft_id=info:pmid/20876982&rfr_iscdi=true