Evaluation of uncertainty in grating pitch measurement by optical diffraction using Monte Carlo methods

Measurement of grating pitch by optical diffraction is one of the few methods currently available for establishing traceability to the definition of the meter on the nanoscale; therefore, understanding all aspects of the measurement is imperative for accurate dissemination of the SI meter. A method for evaluating the component of measurement uncertainty associated with coherent scattering in the diffractometer instrument is presented. The model equation for grating pitch calibration by optical diffraction is an example where Monte Carlo (MC) methods can vastly simplify evaluation of measurement uncertainty. This paper includes discussion of the practical aspects of implementing MC methods for evaluation of measurement uncertainty in grating pitch calibration by diffraction. Downloadable open-source software is demonstrated.