Ex situ Sn diffusion: a well-suited technique for enhancing the photovoltaic properties of a SnS absorber layer

Sn atoms were thermally diffused into tin (II) sulfide (SnS) films prepared using chemical spray pyrolysis. This was achieved by depositing a layer of Sn metal over SnS films followed by annealing of the Sn/SnS bilayer films at 100 °C in high vacuum for 30 min. There was no contamination due to the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of physics. D, Applied physics Applied physics, 2010-11, Vol.43 (44), p.445102-445102
Hauptverfasser: Sajeesh, T H, Kartha, C Sudha, Sanjeeviraja, C, Abe, T, Kashiwaba, Y, Vijayakumar, K P
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Sn atoms were thermally diffused into tin (II) sulfide (SnS) films prepared using chemical spray pyrolysis. This was achieved by depositing a layer of Sn metal over SnS films followed by annealing of the Sn/SnS bilayer films at 100 °C in high vacuum for 30 min. There was no contamination due to the formation of additional phases of Sn compounds up to a very high percentage of Sn diffusion. Contamination due to Sn–O–S phase was removed by Sn diffusion. The samples were optimized to achieve higher photosensitivity and low resistivity. All these enhanced properties were obtained without altering the optimum band gap of the SnS film which is suitable for maximum photovoltaic conversion efficiency.
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/43/44/445102