Carbide formation in tungsten-containing amorphous carbon films by annealing
Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film c...
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| Veröffentlicht in: | Thin solid films 2011-04, Vol.519 (12), p.4049-4053 |
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| container_title | Thin solid films |
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| creator | Balden, M. Sauter, P.A. Jong, S. Adelhelm, C. Lindig, S. Rasinski, M. Plocinski, T. |
| description | Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800
K was investigated by X-ray diffraction for tungsten concentrations below 25
at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800
K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W
2C, and WC
1
−
x
), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails. |
| doi_str_mv | 10.1016/j.tsf.2011.01.403 |
| format | Article |
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K was investigated by X-ray diffraction for tungsten concentrations below 25
at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800
K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W
2C, and WC
1
−
x
), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2011.01.403</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Annealing ; Carbides ; Carbon ; Carbon-based amorphous films ; Chemical reactions ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Defects and impurities: doping, implantation, distribution, concentration, etc ; Deposition by sputtering ; Diffraction ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanomaterials ; Nanostructure ; Phases ; Physics ; Plasma–materials interaction ; Scanning electron microscopy ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Thin solid films, 2011-04, Vol.519 (12), p.4049-4053</ispartof><rights>2011 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c402t-2fbd3fc89487833f0ffee3ab56a0fac280ab721f049fe68905acd4f631bb0fc43</citedby><cites>FETCH-LOGICAL-c402t-2fbd3fc89487833f0ffee3ab56a0fac280ab721f049fe68905acd4f631bb0fc43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0040609011004986$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,23909,23910,25118,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24740446$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Balden, M.</creatorcontrib><creatorcontrib>Sauter, P.A.</creatorcontrib><creatorcontrib>Jong, S.</creatorcontrib><creatorcontrib>Adelhelm, C.</creatorcontrib><creatorcontrib>Lindig, S.</creatorcontrib><creatorcontrib>Rasinski, M.</creatorcontrib><creatorcontrib>Plocinski, T.</creatorcontrib><title>Carbide formation in tungsten-containing amorphous carbon films by annealing</title><title>Thin solid films</title><description>Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800
K was investigated by X-ray diffraction for tungsten concentrations below 25
at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800
K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W
2C, and WC
1
−
x
), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails.</description><subject>Annealing</subject><subject>Carbides</subject><subject>Carbon</subject><subject>Carbon-based amorphous films</subject><subject>Chemical reactions</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Defects and impurities: doping, implantation, distribution, concentration, etc</subject><subject>Deposition by sputtering</subject><subject>Diffraction</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Phases</subject><subject>Physics</subject><subject>Plasma–materials interaction</subject><subject>Scanning electron microscopy</subject><subject>Surfaces and interfaces; 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Sauter, P.A. ; Jong, S. ; Adelhelm, C. ; Lindig, S. ; Rasinski, M. ; Plocinski, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c402t-2fbd3fc89487833f0ffee3ab56a0fac280ab721f049fe68905acd4f631bb0fc43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Annealing</topic><topic>Carbides</topic><topic>Carbon</topic><topic>Carbon-based amorphous films</topic><topic>Chemical reactions</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Defects and impurities: doping, implantation, distribution, concentration, etc</topic><topic>Deposition by sputtering</topic><topic>Diffraction</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Nanomaterials</topic><topic>Nanostructure</topic><topic>Phases</topic><topic>Physics</topic><topic>Plasma–materials interaction</topic><topic>Scanning electron microscopy</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Balden, M.</creatorcontrib><creatorcontrib>Sauter, P.A.</creatorcontrib><creatorcontrib>Jong, S.</creatorcontrib><creatorcontrib>Adelhelm, C.</creatorcontrib><creatorcontrib>Lindig, S.</creatorcontrib><creatorcontrib>Rasinski, M.</creatorcontrib><creatorcontrib>Plocinski, T.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Balden, M.</au><au>Sauter, P.A.</au><au>Jong, S.</au><au>Adelhelm, C.</au><au>Lindig, S.</au><au>Rasinski, M.</au><au>Plocinski, T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Carbide formation in tungsten-containing amorphous carbon films by annealing</atitle><jtitle>Thin solid films</jtitle><date>2011-04-01</date><risdate>2011</risdate><volume>519</volume><issue>12</issue><spage>4049</spage><epage>4053</epage><pages>4049-4053</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800
K was investigated by X-ray diffraction for tungsten concentrations below 25
at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800
K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W
2C, and WC
1
−
x
), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2011.01.403</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Annealing Carbides Carbon Carbon-based amorphous films Chemical reactions Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Defects and impurities: doping, implantation, distribution, concentration, etc Deposition by sputtering Diffraction Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Nanomaterials Nanostructure Phases Physics Plasma–materials interaction Scanning electron microscopy Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
| title | Carbide formation in tungsten-containing amorphous carbon films by annealing |
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