Carbide formation in tungsten-containing amorphous carbon films by annealing
Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film c...
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Veröffentlicht in: | Thin solid films 2011-04, Vol.519 (12), p.4049-4053 |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800
K was investigated by X-ray diffraction for tungsten concentrations below 25
at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800
K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W
2C, and WC
1
−
x
), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2011.01.403 |