Carbide formation in tungsten-containing amorphous carbon films by annealing

Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film c...

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Veröffentlicht in:Thin solid films 2011-04, Vol.519 (12), p.4049-4053
Hauptverfasser: Balden, M., Sauter, P.A., Jong, S., Adelhelm, C., Lindig, S., Rasinski, M., Plocinski, T.
Format: Artikel
Sprache:eng
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Zusammenfassung:Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800 K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W 2C, and WC 1 − x ), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.01.403