Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs

Vertical-cavity surface-emitting lasers emitting at 808 nm with unstrained GaAs/Al0.3Ga0.7As, tensilely strained GaAs(x)P(1-x)/Al0.3Ga0.7As and compressively strained In(1-x-y)Ga(x)Al(y)As/Al0.3Ga0.7As quantum-well active regions have been investigated. A comprehensive model is presented to determin...

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Veröffentlicht in:Optics express 2011-06, Vol.19 (13), p.12569-12581
Hauptverfasser: Zhang, Yan, Ning, Yongqiang, Zhang, Lisen, Zhang, Jinsheng, Zhang, Jianwei, Wang, Zhenfu, Zhang, Jian, Zeng, Yugang, Wang, Lijun
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Sprache:eng
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Zusammenfassung:Vertical-cavity surface-emitting lasers emitting at 808 nm with unstrained GaAs/Al0.3Ga0.7As, tensilely strained GaAs(x)P(1-x)/Al0.3Ga0.7As and compressively strained In(1-x-y)Ga(x)Al(y)As/Al0.3Ga0.7As quantum-well active regions have been investigated. A comprehensive model is presented to determine the composition and width of these quantum wells. The numerical simulation shows that the gain peak wavelength is near 800 nm at room temperature for GaAs well with width of 4 nm, GaAs0.87P0.13 well with width of 13 nm and In0.14Ga0.74Al0.12As well with width of 6 nm. Furthermore, the output characteristics of the three designed quantum-well VCSELs are studied and compared. The results indicate that In0.14Ga0.74Al0.12As is the most appropriate candidate for the quantum well of 808-nm VCSELs.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.19.012569