Epitaxial growth of ensembles of indium phosphide nanowires on various non-single crystal substrates using an amorphous template layer

Indium phosphide (InP) nanowires were grown by metal organic chemical vapor deposition on hydrogenated silicon (Si:H) surfaces prepared on various non-single crystal substrates. Structural and chemical properties of the nanowires were characterized by scanning electron microscopy, energy dispersive...

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Veröffentlicht in:Journal of crystal growth 2011-01, Vol.315 (1), p.157-159
Hauptverfasser: Lohn, Andrew J., Li, Xuema, Kobayashi, Nobuhiko P.
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creator Lohn, Andrew J.
Li, Xuema
Kobayashi, Nobuhiko P.
description Indium phosphide (InP) nanowires were grown by metal organic chemical vapor deposition on hydrogenated silicon (Si:H) surfaces prepared on various non-single crystal substrates. Structural and chemical properties of the nanowires were characterized by scanning electron microscopy, energy dispersive spectroscopy, and X-ray diffraction, elucidating the effect of varying the non-single crystal substrate on nanowire growth. A technique for growing InP nanowires on various non-single crystal substrates, including metals and dielectrics was demonstrated.
doi_str_mv 10.1016/j.jcrysgro.2010.08.050
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subjects A1. Nanostructures
A3. Metal organic vapor phase epitaxy
B1. Nanomaterials
B2. Semiconducting III–V materials
Cross-disciplinary physics: materials science
rheology
Crystal growth
Crystal structure
Crystals
Diffraction
Epitaxial growth
Exact sciences and technology
Indium phosphides
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Nanoscale materials and structures: fabrication and characterization
Nanowires
Other semiconductors
Other topics in nanoscale materials and structures
Physics
Quantum wires
Silicon substrates
Specific materials
Theory and models of film growth
X-rays
title Epitaxial growth of ensembles of indium phosphide nanowires on various non-single crystal substrates using an amorphous template layer
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