Design of Sulfonium Compounds as a Photo-acid Generator

Triarylsulfonium compounds with relatively higher reduction potentials by introduction of electron withdrawing groups and expansion of π-electron resonance were newly designed and synthesized. These sulfonium compounds exhibited high acid generation efficiency, which were cationic polymerization abi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of Photopolymer Science and Technology 2007, Vol.20(5), pp.621-625
Hauptverfasser: Tsuchimura, Tomotaka, Shimada, Kazuto, Ishiji, Youhei, Matsushita, Tetsunori, Aoai, Toshiaki
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Triarylsulfonium compounds with relatively higher reduction potentials by introduction of electron withdrawing groups and expansion of π-electron resonance were newly designed and synthesized. These sulfonium compounds exhibited high acid generation efficiency, which were cationic polymerization ability, by electron transfer induced photo-sensitization with dyes. The thermal stability of these compounds was investigated from a practical standpoint, and also the influence of the stability by varying the counter anion was examined. Further, these sulfonium compounds were applied to radical promoted cationic polymerization and infrared-dye induced photo-sensitization.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.20.621