Design of Sulfonium Compounds as a Photo-acid Generator
Triarylsulfonium compounds with relatively higher reduction potentials by introduction of electron withdrawing groups and expansion of π-electron resonance were newly designed and synthesized. These sulfonium compounds exhibited high acid generation efficiency, which were cationic polymerization abi...
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Veröffentlicht in: | Journal of Photopolymer Science and Technology 2007, Vol.20(5), pp.621-625 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | Triarylsulfonium compounds with relatively higher reduction potentials by introduction of electron withdrawing groups and expansion of π-electron resonance were newly designed and synthesized. These sulfonium compounds exhibited high acid generation efficiency, which were cationic polymerization ability, by electron transfer induced photo-sensitization with dyes. The thermal stability of these compounds was investigated from a practical standpoint, and also the influence of the stability by varying the counter anion was examined. Further, these sulfonium compounds were applied to radical promoted cationic polymerization and infrared-dye induced photo-sensitization. |
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ISSN: | 0914-9244 1349-6336 1349-6336 |
DOI: | 10.2494/photopolymer.20.621 |