Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and hi...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2007, Vol.20(5), pp.643-650 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Zimmerman, Paul A. Peski, Chris van Rice, Bryan Byers, Jeff Turro, Nicholas J. Lei, Xuegong Gejo, Juan Lopez Liberman, Vladmir Palmacci, Steve Rothchild, Mordy Whitker, Andrew Blakey, Idriss Chen, Lan Dargaville, Bronwin Liu, Heping |
| description | Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials. |
| doi_str_mv | 10.2494/photopolymer.20.643 |
| format | Article |
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For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. 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| source | Full-Text Journals in Chemistry (Open access); EZB Electronic Journals Library; J-STAGE |
| subjects | fluid Fluid dynamics Fluid flow Fluids Garnets Immersion Immersion lithograph lens Lenses Lithography Materials selection refractive index resist |
| title | Status of High-Index Materials for Generation-Three 193nm Immersion Lithography |
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