Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and hi...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2007, Vol.20(5), pp.643-650
Hauptverfasser: Zimmerman, Paul A., Peski, Chris van, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothchild, Mordy, Whitker, Andrew, Blakey, Idriss, Chen, Lan, Dargaville, Bronwin, Liu, Heping
Format: Artikel
Sprache:eng
Schlagworte:
fluid
Fluid dynamics
Fluid flow
Fluids
Garnets
Immersion
Immersion lithograph
lens
Lenses
Lithography
Materials selection
refractive index
resist
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Zusammenfassung:Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.20.643