Trends in Patterning Materials for Advanced Lithography

Trends in Patterning Materials for Advanced Lithography

The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists.

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Bibliographische Detailangaben
Veröffentlicht in:Journal of Photopolymer Science and Technology 2007, Vol.20(3), pp.453-455
1. Verfasser: Allen, Robert D.
Format: Artikel
Sprache:eng
Schlagworte:
193nm photoresists
Fluoropolymers
Glass
immersion lithography
imprint lithography
Lithography
Patterning
Photopolymers
Photoresists
Resists
Trends
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Beschreibung
Zusammenfassung:The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.20.453