Assessment of the UV/Chlorine process as an advanced oxidation process
Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H 2O 2 process was selected as a reference, so that the results fro...
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| Veröffentlicht in: | Water research (Oxford) 2011-02, Vol.45 (4), p.1890-1896 |
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| creator | Jin, Jing El-Din, Mohamed Gamal Bolton, James R. |
| description | Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H
2O
2 process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H
2O
2 process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.
► For several organic compounds, the results from the UV/chlorine process were compared with those of the UV/H
2O
2 process. ► With methanol added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples, the photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. ► The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. ► In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. ► The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process. |
| doi_str_mv | 10.1016/j.watres.2010.12.008 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_860381801</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0043135410008353</els_id><sourcerecordid>860381801</sourcerecordid><originalsourceid>FETCH-LOGICAL-c546t-94121a44c3fbf32635647dd2e466ba2206f822f34704530a4080aeabba73a4533</originalsourceid><addsrcrecordid>eNqFkcFu1DAQhi0EotvCGyDIBZVLtuOx43gvlaoVBaRKPcBytSaOTb3KJsXOFnj7OsqW3lrJkqXxN_5H8zH2jsOSA1dn2-UfGqNLS4SphEsA_YItuK5XJUqpX7IFgBQlF5U8YscpbQEAUaxesyPkyLnmuGCXFym5lHauH4vBF-ONKzY_z9Y33RBD74rbONj8XFA-fUHtHfXWtcXwN7Q0hqF_AN6wV5665N4e7hO2ufz8Y_21vLr-8m19cVXaSqqxXMkcTFJa4RsvUIlKybpt0UmlGkIE5TWiF7IGWQkgCRrIUdNQLShXxAk7nf_Nub_3Lo1mF5J1XUe9G_bJaAVCcw38eVIKyRWizOSnJ0le1zWvMK83o3JGbRxSis6b2xh2FP8ZDmayYrZmtmImK4ajmdveHxL2zc61_5seNGTg4wGgZKnzMa85pEdOYl0jV5n7MHOeBkO_YmY233NSldVyUHqKOp8Jly3cBRdNssFN0kJ0djTtEJ6e9R7ZK7Mr</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1777152008</pqid></control><display><type>article</type><title>Assessment of the UV/Chlorine process as an advanced oxidation process</title><source>MEDLINE</source><source>Elsevier ScienceDirect Journals</source><creator>Jin, Jing ; El-Din, Mohamed Gamal ; Bolton, James R.</creator><creatorcontrib>Jin, Jing ; El-Din, Mohamed Gamal ; Bolton, James R.</creatorcontrib><description>Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H
2O
2 process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H
2O
2 process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.
► For several organic compounds, the results from the UV/chlorine process were compared with those of the UV/H
2O
2 process. ► With methanol added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples, the photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. ► The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. ► In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. ► The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.</description><identifier>ISSN: 0043-1354</identifier><identifier>EISSN: 1879-2448</identifier><identifier>DOI: 10.1016/j.watres.2010.12.008</identifier><identifier>PMID: 21211812</identifier><identifier>CODEN: WATRAG</identifier><language>eng</language><publisher>Kidlington: Elsevier Ltd</publisher><subject>Advanced oxidation ; Applied sciences ; Chlorine ; Chlorine - chemistry ; Chlorine compounds ; Chlorine photolysis ; Chlorobenzoates - chemistry ; Cyclohexanecarboxylic Acids - chemistry ; Cyclohexanoic acid ; Exact sciences and technology ; Formaldehyde - chemistry ; free radical scavengers ; Hydrogen peroxide ; Hydrogen Peroxide - chemistry ; Hydrogen-Ion Concentration ; Hydroxyl Radical - chemistry ; Hydroxyl radicals ; Kinetics ; Methanol ; Methanol - analysis ; Methyl alcohol ; Organic compounds ; Oxidation ; Oxidation-Reduction ; p-Chlorobenzoic acid ; photolysis ; Pollution ; Quantum Theory ; Radicals ; Ultraviolet Rays ; wastewater ; Water Purification - methods ; water treatment ; Water treatment and pollution</subject><ispartof>Water research (Oxford), 2011-02, Vol.45 (4), p.1890-1896</ispartof><rights>2010 Elsevier Ltd</rights><rights>2015 INIST-CNRS</rights><rights>2010 Elsevier Ltd. All rights reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c546t-94121a44c3fbf32635647dd2e466ba2206f822f34704530a4080aeabba73a4533</citedby><cites>FETCH-LOGICAL-c546t-94121a44c3fbf32635647dd2e466ba2206f822f34704530a4080aeabba73a4533</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0043135410008353$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65534</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24277216$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/21211812$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Jin, Jing</creatorcontrib><creatorcontrib>El-Din, Mohamed Gamal</creatorcontrib><creatorcontrib>Bolton, James R.</creatorcontrib><title>Assessment of the UV/Chlorine process as an advanced oxidation process</title><title>Water research (Oxford)</title><addtitle>Water Res</addtitle><description>Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H
2O
2 process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H
2O
2 process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.
► For several organic compounds, the results from the UV/chlorine process were compared with those of the UV/H
2O
2 process. ► With methanol added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples, the photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. ► The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. ► In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. ► The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.</description><subject>Advanced oxidation</subject><subject>Applied sciences</subject><subject>Chlorine</subject><subject>Chlorine - chemistry</subject><subject>Chlorine compounds</subject><subject>Chlorine photolysis</subject><subject>Chlorobenzoates - chemistry</subject><subject>Cyclohexanecarboxylic Acids - chemistry</subject><subject>Cyclohexanoic acid</subject><subject>Exact sciences and technology</subject><subject>Formaldehyde - chemistry</subject><subject>free radical scavengers</subject><subject>Hydrogen peroxide</subject><subject>Hydrogen Peroxide - chemistry</subject><subject>Hydrogen-Ion Concentration</subject><subject>Hydroxyl Radical - chemistry</subject><subject>Hydroxyl radicals</subject><subject>Kinetics</subject><subject>Methanol</subject><subject>Methanol - analysis</subject><subject>Methyl alcohol</subject><subject>Organic compounds</subject><subject>Oxidation</subject><subject>Oxidation-Reduction</subject><subject>p-Chlorobenzoic acid</subject><subject>photolysis</subject><subject>Pollution</subject><subject>Quantum Theory</subject><subject>Radicals</subject><subject>Ultraviolet Rays</subject><subject>wastewater</subject><subject>Water Purification - methods</subject><subject>water treatment</subject><subject>Water treatment and pollution</subject><issn>0043-1354</issn><issn>1879-2448</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNqFkcFu1DAQhi0EotvCGyDIBZVLtuOx43gvlaoVBaRKPcBytSaOTb3KJsXOFnj7OsqW3lrJkqXxN_5H8zH2jsOSA1dn2-UfGqNLS4SphEsA_YItuK5XJUqpX7IFgBQlF5U8YscpbQEAUaxesyPkyLnmuGCXFym5lHauH4vBF-ONKzY_z9Y33RBD74rbONj8XFA-fUHtHfXWtcXwN7Q0hqF_AN6wV5665N4e7hO2ufz8Y_21vLr-8m19cVXaSqqxXMkcTFJa4RsvUIlKybpt0UmlGkIE5TWiF7IGWQkgCRrIUdNQLShXxAk7nf_Nub_3Lo1mF5J1XUe9G_bJaAVCcw38eVIKyRWizOSnJ0le1zWvMK83o3JGbRxSis6b2xh2FP8ZDmayYrZmtmImK4ajmdveHxL2zc61_5seNGTg4wGgZKnzMa85pEdOYl0jV5n7MHOeBkO_YmY233NSldVyUHqKOp8Jly3cBRdNssFN0kJ0djTtEJ6e9R7ZK7Mr</recordid><startdate>20110201</startdate><enddate>20110201</enddate><creator>Jin, Jing</creator><creator>El-Din, Mohamed Gamal</creator><creator>Bolton, James R.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>FBQ</scope><scope>IQODW</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SU</scope><scope>8FD</scope><scope>C1K</scope><scope>FR3</scope><scope>KR7</scope><scope>7X8</scope><scope>7QH</scope><scope>7ST</scope><scope>7UA</scope><scope>F1W</scope><scope>H97</scope><scope>L.G</scope><scope>SOI</scope></search><sort><creationdate>20110201</creationdate><title>Assessment of the UV/Chlorine process as an advanced oxidation process</title><author>Jin, Jing ; El-Din, Mohamed Gamal ; Bolton, James R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c546t-94121a44c3fbf32635647dd2e466ba2206f822f34704530a4080aeabba73a4533</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Advanced oxidation</topic><topic>Applied sciences</topic><topic>Chlorine</topic><topic>Chlorine - chemistry</topic><topic>Chlorine compounds</topic><topic>Chlorine photolysis</topic><topic>Chlorobenzoates - chemistry</topic><topic>Cyclohexanecarboxylic Acids - chemistry</topic><topic>Cyclohexanoic acid</topic><topic>Exact sciences and technology</topic><topic>Formaldehyde - chemistry</topic><topic>free radical scavengers</topic><topic>Hydrogen peroxide</topic><topic>Hydrogen Peroxide - chemistry</topic><topic>Hydrogen-Ion Concentration</topic><topic>Hydroxyl Radical - chemistry</topic><topic>Hydroxyl radicals</topic><topic>Kinetics</topic><topic>Methanol</topic><topic>Methanol - analysis</topic><topic>Methyl alcohol</topic><topic>Organic compounds</topic><topic>Oxidation</topic><topic>Oxidation-Reduction</topic><topic>p-Chlorobenzoic acid</topic><topic>photolysis</topic><topic>Pollution</topic><topic>Quantum Theory</topic><topic>Radicals</topic><topic>Ultraviolet Rays</topic><topic>wastewater</topic><topic>Water Purification - methods</topic><topic>water treatment</topic><topic>Water treatment and pollution</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jin, Jing</creatorcontrib><creatorcontrib>El-Din, Mohamed Gamal</creatorcontrib><creatorcontrib>Bolton, James R.</creatorcontrib><collection>AGRIS</collection><collection>Pascal-Francis</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Environmental Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>Engineering Research Database</collection><collection>Civil Engineering Abstracts</collection><collection>MEDLINE - Academic</collection><collection>Aqualine</collection><collection>Environment Abstracts</collection><collection>Water Resources Abstracts</collection><collection>ASFA: Aquatic Sciences and Fisheries Abstracts</collection><collection>Aquatic Science & Fisheries Abstracts (ASFA) 3: Aquatic Pollution & Environmental Quality</collection><collection>Aquatic Science & Fisheries Abstracts (ASFA) Professional</collection><collection>Environment Abstracts</collection><jtitle>Water research (Oxford)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jin, Jing</au><au>El-Din, Mohamed Gamal</au><au>Bolton, James R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Assessment of the UV/Chlorine process as an advanced oxidation process</atitle><jtitle>Water research (Oxford)</jtitle><addtitle>Water Res</addtitle><date>2011-02-01</date><risdate>2011</risdate><volume>45</volume><issue>4</issue><spage>1890</spage><epage>1896</epage><pages>1890-1896</pages><issn>0043-1354</issn><eissn>1879-2448</eissn><coden>WATRAG</coden><abstract>Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H
2O
2 process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H
2O
2 process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.
► For several organic compounds, the results from the UV/chlorine process were compared with those of the UV/H
2O
2 process. ► With methanol added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples, the photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. ► The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. ► In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. ► The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.</abstract><cop>Kidlington</cop><pub>Elsevier Ltd</pub><pmid>21211812</pmid><doi>10.1016/j.watres.2010.12.008</doi><tpages>7</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0043-1354 |
| ispartof | Water research (Oxford), 2011-02, Vol.45 (4), p.1890-1896 |
| issn | 0043-1354 1879-2448 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_860381801 |
| source | MEDLINE; Elsevier ScienceDirect Journals |
| subjects | Advanced oxidation Applied sciences Chlorine Chlorine - chemistry Chlorine compounds Chlorine photolysis Chlorobenzoates - chemistry Cyclohexanecarboxylic Acids - chemistry Cyclohexanoic acid Exact sciences and technology Formaldehyde - chemistry free radical scavengers Hydrogen peroxide Hydrogen Peroxide - chemistry Hydrogen-Ion Concentration Hydroxyl Radical - chemistry Hydroxyl radicals Kinetics Methanol Methanol - analysis Methyl alcohol Organic compounds Oxidation Oxidation-Reduction p-Chlorobenzoic acid photolysis Pollution Quantum Theory Radicals Ultraviolet Rays wastewater Water Purification - methods water treatment Water treatment and pollution |
| title | Assessment of the UV/Chlorine process as an advanced oxidation process |
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