Assessment of the UV/Chlorine process as an advanced oxidation process
Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H 2O 2 process was selected as a reference, so that the results fro...
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Veröffentlicht in: | Water research (Oxford) 2011-02, Vol.45 (4), p.1890-1896 |
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Sprache: | eng |
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Zusammenfassung: | Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H
2O
2 process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H
2O
2 process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process.
► For several organic compounds, the results from the UV/chlorine process were compared with those of the UV/H
2O
2 process. ► With methanol added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples, the photodegradation quantum yields and the
OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H
2O
2 processes. ► The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H
2O
2 process, which reached 0.85 ± 0.04. ► In addition to methanol,
para-chlorobenzoic acid (
pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H
2O
2 solutions, to evaluate the efficiencies of oxidizing these organic compounds. ► The specific first-order reaction rate constants for the oxidation of
pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H
2O
2 process. |
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ISSN: | 0043-1354 1879-2448 |
DOI: | 10.1016/j.watres.2010.12.008 |