Development of ultrananocrystalline diamond (UNCD) coatings for multipurpose mechanical pump seals

Ultrananocrystalline diamond coatings were deposited on SiC dynamic seals. Coatings were prepared by microwave plasma chemical vapor deposition. Utility of UNCD films on SiC seals was shown for improving wear resistance. Effect of different initial roughness on adhesion and wear was studied. Increased initial roughness of SiC surface improves adhesion of coatings. The reliability and performance of silicon carbide (SiC) shaft seals on multipurpose mechanical pumps are improved by applying a protective coating of ultrananocrystalline diamond (UNCD). UNCD exhibits extreme hardness (97 GPa), low friction (0.1 in air) and outstanding chemical resistance. Consequently, the application of UNCD coatings to multipurpose mechanical pump seals can reduce frictional energy losses and eliminate the downtime and hazardous emissions from seal failure and leakage. In this study, UNCD films were prepared by microwave plasma chemical vapor deposition utilizing an argon/methane gas mixture. Prior to coating, the SiC seals were subjected to mechanical polishing using different grades of micron-sized diamond powder to produce different starting surfaces with well-controlled surface roughnesses. Following this roughening process, the seals were seeded by mechanical abrasion with diamond nanopowder, and subsequently coated with UNCD. The coated seals were subjected to dynamic wear testing performed at 3600 RPM and 100 psi for up to 10 days during which the seals were periodically removed and inspected. The UNCD-coated seals were examined using Raman microanalysis, scanning electron microscopy, optical profilometry, and adhesion testing before and after the wear testing. These analyses revealed that delamination of the UNCD films was prevented when the initial SiC seal surface had an initial roughness >0.1 μm. In addition, the UNCD surfaces showed no measurable wear as compared to approximately 0.2 μm of wear for the untreated SiC surfaces.