Fabrication of nano-gap electrodes and nano wires using an electrochemical and chemical etching technique

This paper reports a simple and controllable technique to fabricate nano-gap electrodes using a combined electrochemical and chemical etching. A line of metal is initially patterned using a conventional lithography process at the width of 2 mu m. The line is then continuously etched until it is disc...

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Veröffentlicht in:Journal of micromechanics and microengineering 2010-04, Vol.20 (4), p.045016-045016
Hauptverfasser: Sutanto, Jemmy, Smith, Rosemary L, Collins, Scotts D
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Sprache:eng
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