Fabrication of nano-gap electrodes and nano wires using an electrochemical and chemical etching technique

This paper reports a simple and controllable technique to fabricate nano-gap electrodes using a combined electrochemical and chemical etching. A line of metal is initially patterned using a conventional lithography process at the width of 2 mu m. The line is then continuously etched until it is disc...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of micromechanics and microengineering 2010-04, Vol.20 (4), p.045016-045016
Hauptverfasser:	Sutanto, Jemmy, Smith, Rosemary L, Collins, Scotts D
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical etching Electrodes Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Lithography Mechanical engineering. Machine design Mechanical instruments, equipment and techniques Microelectronic fabrication (materials and surfaces technology) Micromechanical devices and systems Nanocomposites Nanomaterials Nanostructure Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Stability Wire
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	This paper reports a simple and controllable technique to fabricate nano-gap electrodes using a combined electrochemical and chemical etching. A line of metal is initially patterned using a conventional lithography process at the width of 2 mu m. The line is then continuously etched until it is discontinued at the desirable gap. We have been successfully fabricated a
ISSN:	0960-1317 1361-6439
DOI:	10.1088/0960-1317/20/4/045016