Adhesion and stress of magnesium oxide thin films: Effect of thickness, oxidation temperature and duration
Nanoscale magnesium oxide thin films have been deposited on glass substrate by thermal oxidation (in air) of vacuum evaporated magnesium films. X-ray diffraction (XRD) showed orientation along (2 0 0) and (2 2 0) directions. The mechanical properties of the MgO thin films were found to be the functi...
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Veröffentlicht in: | Applied surface science 2010-05, Vol.256 (14), p.4582-4585 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Nanoscale magnesium oxide thin films have been deposited on glass substrate by thermal oxidation (in air) of vacuum evaporated magnesium films. X-ray diffraction (XRD) showed orientation along (2
0
0) and (2
2
0) directions. The mechanical properties of the MgO thin films were found to be the function of thickness (300, 450 and 600
nm), oxidation temperature (573, 623 and 673
K) and oxidation duration (90 and 180
min). As oxidation temperature and oxidation duration increases, adhesion and intrinsic stress were found to increase. Intrinsic stress decreased whereas adhesion increased due to increase in thin film thickness. The value of intrinsic stress was in range 28.902–73.212 (×10
7
N/m
2) and that of adhesion was 12.1–27.4 (×10
4
N/m
2) for the thin film of thickness 300
nm. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2010.02.052 |