Galvanic Porous Silicon Composites for High-Velocity Nanoenergetics

Porous silicon (PS) films ∼65−95 μm thick composed of pores with diameters less than 3 nm were fabricated using a galvanic etching approach that does not require an external power supply. A highly reactive, nanoenergetic composite was then created by impregnating the nanoscale pores with the strong...

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Veröffentlicht in:Nano letters 2011-02, Vol.11 (2), p.803-807
Hauptverfasser: Becker, Collin R, Apperson, Steven, Morris, Christopher J, Gangopadhyay, Shubhra, Currano, Luke J, Churaman, Wayne A, Stoldt, Conrad R
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Sprache:eng
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Zusammenfassung:Porous silicon (PS) films ∼65−95 μm thick composed of pores with diameters less than 3 nm were fabricated using a galvanic etching approach that does not require an external power supply. A highly reactive, nanoenergetic composite was then created by impregnating the nanoscale pores with the strong oxidizer, sodium perchlorate (NaClO4). The combustion propagation velocity of the energetic composite was measured using microfabricated diagnostic devices in conjunction with high-speed optical imaging up to 930000 frames per second. Combustion velocities averaging 3050 m/s were observed for PS films with specific surface areas of ∼840 m2/g and porosities of 65−67%.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl104115u