Polymorphous Silicon: A Promising Material for Thin-Film Transistors for Low-Cost and High-Performance Active-Matrix OLED Displays
Hydrogenated polymorphous Silicon allows to fabricate TFTs with very interesting characteristics including better threshold voltage stability than a-Si TFTs, lower leakage current than µc-Si: H TFTs and excellent uniformity. Investigation of threshold voltage shift mechanisms of pm-Si: H TFTs has sh...
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Veröffentlicht in: | IEICE Transactions on Electronics 2010/10/01, Vol.E93.C(10), pp.1490-1494 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Hydrogenated polymorphous Silicon allows to fabricate TFTs with very interesting characteristics including better threshold voltage stability than a-Si TFTs, lower leakage current than µc-Si: H TFTs and excellent uniformity. Investigation of threshold voltage shift mechanisms of pm-Si: H TFTs has shown a specific semiconductor material degradation with different activation energies compared to a-Si: H TFTs. TEM analysis has evidenced for the first time a significant structural difference between pm-Si: H and a-Si: H materials, in the TFT device configuration. Pm-Si: H appears to be very suitable for low cost and high performance AM-OLED fabrication. |
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ISSN: | 0916-8524 1745-1353 1745-1353 |
DOI: | 10.1587/transele.E93.C.1490 |