A new method for calculation of island-size distribution in submonolayer epitaxial growth

In this paper, a novel method for calculation of island-size distribution in one-dimensional submonolayer epitaxial growth based on difference-differential rate equations is introduced. Moreover, precise analytic expressions for the first several Taylor coefficients of the distribution (with respect...

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Veröffentlicht in:	Applied mathematical modelling 2011-03, Vol.35 (3), p.1331-1336
Hauptverfasser:	Petrov, P.P., Miller, W., Rehse, U., Fornari, R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Deposition Diffusion Epitaxial growth Error analysis Exact sciences and technology Exact solutions Island-size distribution Lattice systems Materials science Mathematical analysis Mathematical models Mathematics Methods of deposition of films and coatings film growth and epitaxy Molecular, atomic, ion, and chemical beam epitaxy Ordinary differential equations Physics Rate equations Sciences and techniques of general use
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Beschreibung
Zusammenfassung:	In this paper, a novel method for calculation of island-size distribution in one-dimensional submonolayer epitaxial growth based on difference-differential rate equations is introduced. Moreover, precise analytic expressions for the first several Taylor coefficients of the distribution (with respect to the ratio of diffusion and deposition rates) are obtained and the corresponding error term is estimated.
ISSN:	0307-904X
DOI:	10.1016/j.apm.2010.09.010