Preparation of p-type CdS thin films and in situ dark conductivity in vacuum deposited CdS:Cu films

CdS:Cu thin films were prepared using a vacuum co-evaporation technique. The Hall measurements indicate that the conductivity characteristic of CdS thin films transformed from highly compensated in as-grown or weakly annealed materials to p-type conductive in strongly annealed materials. X-ray diffr...

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Veröffentlicht in:Applied surface science 2010-12, Vol.257 (5), p.1623-1627
Hauptverfasser: Xie, Hanke, Tian, Caijuan, Li, Wei, Feng, Lianghuan, Zhang, Jingquan, Wu, Lili, Cai, Yaping, Lei, Zhi, Yang, Yujin
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Sprache:eng
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Zusammenfassung:CdS:Cu thin films were prepared using a vacuum co-evaporation technique. The Hall measurements indicate that the conductivity characteristic of CdS thin films transformed from highly compensated in as-grown or weakly annealed materials to p-type conductive in strongly annealed materials. X-ray diffraction spectra show that as-deposited thin films were the hexagonal phase of CdS except the presence of copper for high Cu doping and the diffraction peaks of Cu disappeared after annealing. From the X-ray photoelectron spectroscopy we found the ionization of Cu atoms and the formation of an acceptor level. In situ dark conductivity in vacuum as-deposited CdS:Cu was performed in the temperature range between 27 and 250 °C. An abnormal temperature dependence of conductivity was observed in medium and heavily Cu-doped films. The formation of a p-type material at a certain temperature was also studied by the hot probe measurements, which indicates a complex compensation process in the Cu-doped CdS films.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2010.08.110