Increasing the accuracy of diffractometric measurement of microrelief in integrated circuits

Increasing the accuracy of diffractometric measurement of microrelief in integrated circuits

We present a method for reducing error in diffractometric measurement of the dimensions of components of integrated circuits by reducing the systematic error introduced by the descriptive medel of the object of measurement.[PUBLICATION ABSTRACT]

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Veröffentlicht in:Measurement techniques 1998-03, Vol.41 (3), p.207-209
Hauptverfasser: Beklemishev, N. N., Benevolenskii, S. B., Istomina, I. L., Kopylov, P. V.
Format: Artikel
Sprache:eng
Schlagworte:
Diffraction
Dimensional measurements
Error analysis
Errors
Integrated circuits
Systematic errors
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Beschreibung
Zusammenfassung:We present a method for reducing error in diffractometric measurement of the dimensions of components of integrated circuits by reducing the systematic error introduced by the descriptive medel of the object of measurement.[PUBLICATION ABSTRACT]
ISSN:0543-1972
1573-8906
DOI:10.1007/BF02503884