Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics
The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferome...
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| Veröffentlicht in: | Applied Optics 1995-10, Vol.34 (28), p.6389-6392 |
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| container_end_page | 6392 |
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| container_issue | 28 |
| container_start_page | 6389 |
| container_title | Applied Optics |
| container_volume | 34 |
| creator | Da Silva, L B Barbee, Jr, T W Cauble, R Celliers, P Ciarlo, D Moreno, J C Mrowka, S Trebes, J E Wan, A S Weber, F |
| description | The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas. |
| doi_str_mv | 10.1364/AO.34.006389 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 1559-128X |
| ispartof | Applied Optics, 1995-10, Vol.34 (28), p.6389-6392 |
| issn | 1559-128X 0003-6935 1539-4522 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_763257405 |
| source | Alma/SFX Local Collection; Optica Publishing Group Journals |
| subjects | 70 PLASMA PHYSICS AND FUSION DESIGN EXTREME ULTRAVIOLET RADIATION INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS INTERFEROMETERS LAYERS MOLYBDENUM PLASMA DIAGNOSTICS SILICON TESTING |
| title | Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics |
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