Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics

The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferome...

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Veröffentlicht in:	Applied Optics 1995-10, Vol.34 (28), p.6389-6392
Hauptverfasser:	Da Silva, L B, Barbee, Jr, T W, Cauble, R, Celliers, P, Ciarlo, D, Moreno, J C, Mrowka, S, Trebes, J E, Wan, A S, Weber, F
Format:	Artikel
Sprache:	eng
Schlagworte:	70 PLASMA PHYSICS AND FUSION DESIGN EXTREME ULTRAVIOLET RADIATION INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS INTERFEROMETERS LAYERS MOLYBDENUM PLASMA DIAGNOSTICS SILICON TESTING
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Beschreibung
Zusammenfassung:	The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.
ISSN:	1559-128X 0003-6935 1539-4522
DOI:	10.1364/AO.34.006389