Nearly massless electrons in the silicon interface with a metal film

We demonstrate the realization of nearly massless electrons in the most widely used device material, silicon, at the interface with a metal film. Using angle-resolved photoemission, we found that the surface band of a monolayer lead film drives a hole band of the Si inversion layer formed at the int...

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Veröffentlicht in:Physical review letters 2010-06, Vol.104 (24), p.246803-246803, Article 246803
Hauptverfasser: Kim, Keun Su, Jung, Sung Chul, Kang, Myung Ho, Yeom, Han Woong
Format: Artikel
Sprache:eng
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Zusammenfassung:We demonstrate the realization of nearly massless electrons in the most widely used device material, silicon, at the interface with a metal film. Using angle-resolved photoemission, we found that the surface band of a monolayer lead film drives a hole band of the Si inversion layer formed at the interface with the film to have a nearly linear dispersion with an effective mass about 20 times lighter than bulk Si and comparable to graphene. The reduction of mass can be accounted for by a repulsive interaction between neighboring bands of the metal film and Si substrate. Our result suggests a promising way to take advantage of massless carriers in silicon-based thin-film devices, which can also be applied to various other semiconductor devices.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.104.246803