Float-polishing process and analysis of float-polished quartz

A fluid-mechanical model is developed for the float-polishing process. In this model laminar flow between the sample and the lap results in pressure gradients at the grooves that support the sample on a fluid layer. The laminar fluid motion also produces supersmooth, damage-free surfaces. Quartz sub...

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Veröffentlicht in:Applied Optics 1994-01, Vol.33 (1), p.89-95
Hauptverfasser: Soares, S F, Baselt, D R, Black, J P, Jungling, K C, Stowell, W K
Format: Artikel
Sprache:eng
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Zusammenfassung:A fluid-mechanical model is developed for the float-polishing process. In this model laminar flow between the sample and the lap results in pressure gradients at the grooves that support the sample on a fluid layer. The laminar fluid motion also produces supersmooth, damage-free surfaces. Quartz substrates for applications in high-stress environments were float polished, and their surfaces were analyzed by optical scatterometry, photoacoustic spectroscopy, and atomic force microscopy. The removal of 100 µm of material by a lapping-polishing process, with final float polishing, left low levels of subsurface damage, with a surface roughness of approximately 0.2-nm rms.
ISSN:1559-128X
0003-6935
1539-4522
DOI:10.1364/ao.33.000089