Front-end design issues in soft-x-ray projection lithography

We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system. Other drivers; undulator, synchrotron orbital radiation,...

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Veröffentlicht in:	Applied Optics 1993-12, Vol.32 (34), p.7050-7056
Hauptverfasser:	Ceglio, N M, Hawryluk, A M, Sommargren, G E
Format:	Artikel
Sprache:	eng
Schlagworte:	426000 - Engineering- Components, Electron Devices & Circuits- (1990-) DESIGN ELECTROMAGNETIC RADIATION ELECTRONIC CIRCUITS ENERGY SYSTEMS ENGINEERING FABRICATION INTEGRATED CIRCUITS IONIZING RADIATIONS LIGHTING SYSTEMS MICROELECTRONIC CIRCUITS RADIATIONS SOFT X RADIATION X RADIATION
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Beschreibung
Zusammenfassung:	We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system. Other drivers; undulator, synchrotron orbital radiation, and plasma discharge, are also discussed.
ISSN:	1559-128X 0003-6935 1539-4522
DOI:	10.1364/AO.32.007050