High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping
We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material...
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| Veröffentlicht in: | Microelectronic engineering 2010-04, Vol.87 (4), p.663-667 |
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| container_title | Microelectronic engineering |
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| creator | López-Romero, D. Barrios, C.A. Holgado, M. Laguna, M.F. Casquel, R. |
| description | We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. We also show the capability of these structures to trap liquid–water infiltrated among the SU-8 nano-pillars after proper chemical treatment. |
| doi_str_mv | 10.1016/j.mee.2009.09.007 |
| format | Article |
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Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. 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Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. We also show the capability of these structures to trap liquid–water infiltrated among the SU-8 nano-pillars after proper chemical treatment.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Diffusion</subject><subject>Diffusion in nanoscale solids</subject><subject>Diffusion in solids</subject><subject>Electron-beam lithography</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Lattices</subject><subject>Liquids</subject><subject>Materials science</subject><subject>Methods of nanofabrication</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanoscale pattern formation</subject><subject>Nanostructure</subject><subject>Photoresist</subject><subject>Physics</subject><subject>Polymeric nanostructures</subject><subject>Process parameters</subject><subject>Proximity effect (electricity)</subject><subject>Proximity effects, weak links, tunneling phenomena, and josephson effects, adreev effect, sn and sns junctions</subject><subject>Semiconductor electronics. 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Solid state devices</subject><subject>Superconductivity</subject><subject>Transport properties of condensed matter (nonelectronic)</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouH78AG-5iKes-WibFk8i6gqCB_Uc0mSqs3TbmmQV_70pKx6FgWHI876TeQk5E3wpuKgu18sNwFJy3izn4nqPLEStFSvLqt4ni8xo1iihD8lRjGue54LXCxJW-PZObZzAJRZswpE-v7KaBogYEx3sMLIJ-94G2tuU0AFtvymwFuyGegxZRr8CJhzeqB08xRSpnaYe3ew10G7MQvzYoqcp5IfMnZCDzvYRTn_7MXm9u325WbHHp_uHm-tH5gpZJqaErZquUSWXopJl57Tk2rau85WsKvCWF6rQQiuvlPdFUcvGq7ZoRCsa6TupjsnFzncK48cWYjIbjA7yLQOM22h0qbTK8YhMih3pwhhjgM5MATc2fBvBzRyvWZscr5njNXNxnTXnv-42Ott3wQ4O459QyqKUop5_cbXjIJ_6iRBMdAiDg114xo_4z5YfsbaPsQ</recordid><startdate>20100401</startdate><enddate>20100401</enddate><creator>López-Romero, D.</creator><creator>Barrios, C.A.</creator><creator>Holgado, M.</creator><creator>Laguna, M.F.</creator><creator>Casquel, R.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20100401</creationdate><title>High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping</title><author>López-Romero, D. ; Barrios, C.A. ; Holgado, M. ; Laguna, M.F. ; Casquel, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c425t-31a69f935021625fc7207abcfd6266eda04347173d33dd44829d3b491b192df23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Diffusion</topic><topic>Diffusion in nanoscale solids</topic><topic>Diffusion in solids</topic><topic>Electron-beam lithography</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Lattices</topic><topic>Liquids</topic><topic>Materials science</topic><topic>Methods of nanofabrication</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Nanocomposites</topic><topic>Nanomaterials</topic><topic>Nanoscale pattern formation</topic><topic>Nanostructure</topic><topic>Photoresist</topic><topic>Physics</topic><topic>Polymeric nanostructures</topic><topic>Process parameters</topic><topic>Proximity effect (electricity)</topic><topic>Proximity effects, weak links, tunneling phenomena, and josephson effects, adreev effect, sn and sns junctions</topic><topic>Semiconductor electronics. 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Solid state devices</topic><topic>Superconductivity</topic><topic>Transport properties of condensed matter (nonelectronic)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>López-Romero, D.</creatorcontrib><creatorcontrib>Barrios, C.A.</creatorcontrib><creatorcontrib>Holgado, M.</creatorcontrib><creatorcontrib>Laguna, M.F.</creatorcontrib><creatorcontrib>Casquel, R.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>López-Romero, D.</au><au>Barrios, C.A.</au><au>Holgado, M.</au><au>Laguna, M.F.</au><au>Casquel, R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping</atitle><jtitle>Microelectronic engineering</jtitle><date>2010-04-01</date><risdate>2010</risdate><volume>87</volume><issue>4</issue><spage>663</spage><epage>667</epage><pages>663-667</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. We also show the capability of these structures to trap liquid–water infiltrated among the SU-8 nano-pillars after proper chemical treatment.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2009.09.007</doi><tpages>5</tpages></addata></record> |
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| ispartof | Microelectronic engineering, 2010-04, Vol.87 (4), p.663-667 |
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| language | eng |
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| subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Diffusion Diffusion in nanoscale solids Diffusion in solids Electron-beam lithography Electronics Exact sciences and technology Lattices Liquids Materials science Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Nanocomposites Nanomaterials Nanoscale pattern formation Nanostructure Photoresist Physics Polymeric nanostructures Process parameters Proximity effect (electricity) Proximity effects, weak links, tunneling phenomena, and josephson effects, adreev effect, sn and sns junctions Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Superconductivity Transport properties of condensed matter (nonelectronic) |
| title | High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping |
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