High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping
We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material...
Gespeichert in:
Veröffentlicht in: | Microelectronic engineering 2010-04, Vol.87 (4), p.663-667 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. We also show the capability of these structures to trap liquid–water infiltrated among the SU-8 nano-pillars after proper chemical treatment. |
---|---|
ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/j.mee.2009.09.007 |